Mentor Graphics Corporation

Optical Physics Company

Oberdan Otto

Richard A Hutchin

Yuri Granik

Juan Andres Torres Robles

Mark C Simmons

The invention provides for the acceleration of a source mask optimization process. In some implementations, a layout design is analyzed by a pattern matching process, wherein sections of the layout design having similar patterns are identified and consolidated into pattern groups. Subsequently, sections of the layout design corresponding to the pattern groups may be analyzed to determine their compatibility with the optical lithographic process, and the compatibility of these sections may be classified based upon a 'cost function.' With further implementations, the analyzed sections may be classified as printable or difficult to print, depending upon the particular lithographic system. The compatibility of various sections of a layout design may then be utilized to optimize the layout design during a lithographic friendly design process. For example, during the design phase, sections categorized as difficult to print may be flagged for further optimization, processing, or redesign. In further implementations, the difficult-to-print sections may be subjected to a source mask optimization process. Subsequently, the entire layout design may receive a conventional resolution enhancement treatment using the optimized source.

Layout content analysis for source mask optimization acceleration

Aspects of the invention relate to pattern matching of layout design data. Layout design data is searched to identify configurations of geometric elements that match a reference pattern based on an anchor edge in the reference pattern. An edge in a search window area matching the anchor edge may first be selected as anchor matching edge. A search portion of the reference pattern is then compared with the region of the search window area corresponding to the selected anchor matching edge.

Fast pattern matching

A wavefront tilt measurement system for measuring the wavefront tilt of light passing through transmitting or receiving optical systems, the optical systems including a primary aperture and internal optical elements defining an optical system focal plane. A light source emits light at the optical system focal plane towards the internal optical elements such that light from the light source emerges from the primary aperture. A plurality of tilt sensors are disposed adjacent to the primary aperture to receive light emerging from the primary aperture. Each tilt sensor includes a sensor focal plane and a plurality of detector elements. Each tilt sensor generates at the focal plane a plurality of overlapping regions of zero and first order images of light emerging from the primary aperture. The measured intensity of light in the overlapping regions is used to determine the wavefront tilt of light emerging from the primary aperture.

System for measuring wavefront tilt in optical systems and method of calibrating wavefront sensors

A high speed high resolution spectral sensor is formed by placing a cascade of chained wide field-of-view Mach-Zender interferometers inside a dispersive sensor between the sensor's grating and the focusing lens. Also is disclosed an optical filter with wide field-of-view capabilities. Such a filter is formed by inserting a plurality of gap plates of certain thicknesses and refractive indices. The invention provides formulas for calculation of optimal dimensions for such gap plates.

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Camarillo, CA, United States of America

Oberdan Otto