Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

O Jun Kwon

Jeong Kweon Park

Kang Il Cho

Kang Hee Cho

Ji Seong Noh

Jin Tae Park

Provided is an apparatus for coating a photoresist on a substrate. The photoresist coating apparatus includes a nozzle, a discharge unit, and a foreign substance barrier. The nozzle coats a photoresist on the substrate. The discharge unit is formed in a body with a lower portion of the nozzle and discharges a photoresist. The foreign substance barrier is formed at a front lower portion of the nozzle and protects the discharge unit from a foreign substance on the substrate.

Apparatus and method for coating photoresist

A slit coater including an apparatus for supplying coating solution by a coating method using a slit nozzle, which is configured to minimize contamination of coating solution, utilizing a filtering function, and supplying a controlled amount of photosensitive solution to a slit nozzle. The slit coater further includes a table on which an object to be processed is mounted, a slit nozzle unit that applies coating solution onto a surface of the object to be processed, and a coating solution supply apparatus including a storage tank that stores the coating solution, a pump that supplies the coating solution stored in the storage tank to the slit nozzle unit, and a buffer tank that is in fluid communication with the pump and the storage tank.

Slit coater having apparatus for supplying a coater solution

An apparatus for fabricating a liquid crystal display panel includes a slit nozzle for applying a photo-resist liquid on a substrate, a nozzle driver for driving the slit nozzle, an air intake for inhaling air and/or impurities on the substrate through the slit nozzle before photo-resist is deposited on the substrate, and a gas supplier for supplying a gas through one or more channels in the slit nozzle to the substrate after the photo-resist is deposited on the substrate.

Method of fabricating liquid crystal display panel for coating liquid on substrate

A glass support pin for supporting a glass substrate for use with a liquid crystal display device is provided. In one embodiment, the glass support pin includes a plurality of branch pins, and one or more elastic members. The plurality of branch pins is structured to have top ends. The top ends of the branch pins are spread outwardly in the radial direction. The one or more elastic members are attached to the branch pins. The glass support pin is open by pulling the top ends of the branch pins outwardly according to a longitudinal movement of the glass support pin.

Glass support pin

A shuttle is disclosed in which a large-sized substrate is prevented from sagging under its weight or from slipping. The shuttle includes a body, support pins supporting sides of the substrate, and shuttle arms provided to sides of the body to rotate in an axial direction and move in a right-to-left direction. The support pins are coupled with the shuttle arms, respectively. A pair of center supports support center parts of sides of the substrate not supported by the support pins. The center supports are movably coupled to a main frame in a front-to-rear direction. A driving unit moves and rotates the shuttle arms in the right-to-left direction. The driving unit moves the center supports in the front-to-rear direction using the main frame. A vacuum instrument assembly is provided to each of the support pins to securely hold the substrate by a vacuum force.

Substrate carrying method thereof

A slit coater with a standby unit for a nozzle and a coating method using the same prevents environmental pollution by solvent steam and simultaneously maintains the slit nozzle in an optimum state. When in standby and not performing a coating application, the slit nozzle is kept in a standby unit having a solvent atmosphere therein. The slit coater includes: a table on which an object to be processed is positioned; a slit nozzle for applying a coating solution onto a surface of the object; and a standby unit into which the slit nozzle is loaded when on standby, and having a shutter at the opening thereof to maintain an inner space in a substantially hermetically sealed solvent atmosphere. The atmosphere in the standby unit is configured to prevent hardening of the coating solution in the slit nozzle and thereby maintain the slit nozzle in the optimum state for providing coating applications.

Growing community of inventors

Gyeongsan-si, South Korea

O Jun Kwon