Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

O-Byoung Kwon

Sang-Hoon Jang

Sang-tae Kim

Young-Chul Park

In-Ho Yu

Suck-Jun Lee

Joon-Woo Lee

Young-Jun Jin

Min-Ki Lim

Hong-Sick Park

Yu-Jin Lee

Wang-Woo Lee

Young-Jin Yoon

Kyong-Min Kang

Dong-Ki Kim

Shin-Il Choi

Byeong-Jin Lee

Ji-Young Park

Seon-Il Kim

Seung-Jae Yang

Hye-Ra Shin

Sang-Gab Kim

Sang Gab Kim

Bong-Kyun Kim

Jong-Hyun Choung

Hong-Sik Park

Kyung-Bo Shim

An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.

Etchant, display device and method for manufacturing display device using the same

An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (HPO) of about 40% by weight to about 70% by weight, nitric acid (HNO) of about 5% by weight to about 15% by weight, acetic acid (CHCOOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.

Etching composition and method of manufacturing a display substrate using the system

Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.

Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant

An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH)-containing compound, a cyclic amine compound, and the remaining amount of water.

Method of etching a pixel electrode

Etching composition for etching a transparent electrode

An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.

Echtant and method for manufacturing display device using the same

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Wanju-gun, South Korea

O-Byoung Kwon