Nitto-Denko Corporation

Nozomi Fujino

Tomotake Nashiki

Daiki Kato

Masayoshi Katagiri

Hironobu Machinaga

Hiroyuki Takao

Yoshimasa Sakata

Kazuaki Sasa

Motoki Haishi

Eri Ueda

Kenta Watanabe

Minoru Kanatani

Hideyuki Yonezawa

Tomoya Matsuda

Rie Kawakami

Koichiro Tada

Taisuke Karasuda

A light-transmitting electroconductive film () according to the present invention includes a region containing krypton at a content ratio of less than 0.1 atomic % at least partially in a thickness direction (D) of the light-transmitting electroconductive film (). A transparent electroconductive film (X) according to the present invention includes a transparent substrate (); and the light-transmitting electroconductive film () disposed on one surface side in the thickness direction (D) of the transparent substrate.

Light-transmitting electroconductive film and transparent electroconductive film

A transparent conductive layerincludes a first main surfaceexposed to the outside, and a second main surfaceopposite to the first main surfacein a thickness direction. The transparent conductive layeris single layer extending in a plane direction. The transparent conductive layerhas a first grain boundaryin which two end edgesin a cross-sectional view are open to the first main surface, and an intermediate regionbetween both end edgesis not in contact with the second main surface, and has a first crystal grainpartitioned by the first grain boundaryand facing only the first main surface

Transparent conductive layer, transparent conductive sheet, touch sensor, light control element, photoelectric conversion element, heat ray control member, antenna, electromagnetic wave shield member, and image display device

A transparent electroconductive layerincludes a first main surfaceand a second main surfacefacing each other in a thickness direction. The transparent electroconductive layeris a single layer extending in a plane direction perpendicular to the thickness direction. The transparent electroconductive layerhas a plurality of crystal grains, a plurality of first grain boundariespartitioning the plurality of crystal grainsand having each of one end edgeand another end edgein the thickness direction open in each of the first main surfaceand the second main surface, and a second grain boundarybranching from a first intermediate portionof one first grain boundaryA and reaching a second intermediate portionof another first grain boundaryB.

Transparent electroconductive layer, transparent electroconductive sheet, touch sensor, light control element, photoelectric conversion element, heat ray control member, antenna, electromagnetic wave shield member, and image display device

An electrochromic light adjusting member sequentially includes a transparent substrate, a light transmitting electrically conductive layer, and an electrochromic light adjusting layer. The light transmitting electrically conductive layer sequentially includes a first indium-based electrically conductive oxide layer, a metal layer, and a second indium-based electrically conductive oxide layer.

Electrochromic light adjusting member, light transmitting electrically conductive film, and electrochromic light adjusting element

The light transmitting conductive film includes a light transmitting substrate and a non-crystal light transmitting conductive layer, wherein the conditions (1) to (3) below are satisfied when the non-crystal light transmitting conductive layer has a carrier density of Xa&#xd7;10(/cm) and a hole mobility of Ya (cm/V&#xb7;s); a heated light transmitting conductive layer has a carrier density of Xc&#xd7;10(/cm) and a hole mobility of Yc (cm/V&#xb7;s), wherein the heated light transmitting conductive layer is the non-crystal light transmitting conductive layer after going through heating; and a moving distance L is {(Xc&#x2212;Xa)+(Yc&#x2212;Ya)}:

Light transmitting conductive film and light control film

A light modulation film () includes a light modulation layer () whose state is reversibly changed between a transparent state by hydrogenation and a reflective state by dehydrogenation, and a catalyst layer () that promotes hydrogenation and dehydrogenation in the light modulation layer, in this order on a polymer film substrate (). light modulation layer () includes a light modulation region () having a thickness of 10 nm or more on a catalyst layer ()-side, and an oxidized region () on a polymer film substrate ()-side.

Light modulation film and method for manufacturing same, and light modulation element

The light modulation film () is a hydrogen-activation-type light modulation film that includes an inorganic oxide layer (), a light modulation layer () and a catalyst layer (), in this order on a polymer film substrate (). The light modulation layer () is a layer for reversibly changing states between a transparent state due to hydrogenation and a reflective state due to dehydrogenation. The catalyst layer () promotes hydrogenation and dehydrogenation in the light modulation layer. The inorganic oxide layer () contains an oxide of an element different from a metal element that constitutes the light modulation layer ().

Light-modulating film and method for producing same, and light-modulating element

There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate by means of a sputtering method using a sputtering gas including argon, wherein an existing atomic amount of argon atoms in the transparent conductive layer is 0.24 atomic % or less; an existing atomic amount of hydrogen atoms in the transparent conductive layer is 13&#xd7;10atoms/cmor less; and the transparent conductive layer has a specific resistance of 1.1&#xd7;10&#x3a9;&#xb7;cm or more and 2.8&#xd7;10&#x3a9;&#xb7;cm or less.

Transparent conductive film and method for producing the same

A transparent conductive film includes: a transparent substrate film; an antistripping layer with a thickness of 1.5 nm to 8 nm formed on one main surface of the substrate film; an optical adjustment layer with a thickness of 10 nm to 25 nm formed on the antistripping layer; and a transparent conductor layer with a pattern formed on the optical adjustment layer. The transmission Y value measured from a side of the transparent conductor layer is 88.0 or more and the reflection color difference &#x394;E between a pattern portion and a non-pattern portion is 7.0 or less.

Transparent conductive film

A transparent conductive filmincludes, in this order, a transparent substrate, a first optical adjustment layer, an inorganic layer, and a transparent conductive layer. The first optical adjustment layerhas refractive index nC lower than refractive index nA of the transparent substrate, and thickness TC of 10 nm or more and 35 nm or less. The inorganic layerhas refractive index nD that is lower than the absolute value |nC&#xd7;1.13| of a value obtained by multiplying the refractive index nC of the first optical adjustment layerby 1.13.

A transparent electroconductive film with a protective film includes: a transparent electroconductive film including a film substrate, an optical adjustment layer formed on one main surface of the film substrate, and a transparent conductive layer formed on the optical adjustment layer; and a protective film bonded to a main surface of the film substrate on a side opposite to the transparent conductive layer, wherein the transparent electroconductive film and the protective film are thermally shrinkable in at least one direction in a main surface, and the absolute value of the maximum thermal shrinkage ratio (%) of the transparent electroconductive film in a main surface is smaller than the absolute value of the maximum thermal shrinkage ratio (%) of the protective film in a main surface, and the difference between the absolute values is 0.05% to 0.6%.

Transparent electroconductive film with protective film

Disclosed is a polarizing plate with a pressure sensitive adhesive including an infrared reflecting layer and a pressure sensitive adhesive layer in this over on one surface of a polarizer. The pressure sensitive adhesive layer is an outermost surface layer of the polarizing plate with a pressure sensitive adhesive. The polarizing plate with a pressure sensitive adhesive may further include a quarter wave plate.

Polarizing plate with pressure sensitive adhesive, front protective plate and image display device

There is provided a transparent conductive film which has a transparent conductive layer having low specific resistance and has excellent scratch resistance. A transparent conductive film of the present invention includes: a transparent film substrate; at least three undercoat layers; and a transparent conductive layer in this order. The at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is an SiOfilm from a side of the film substrate. The third undercoat layer has a density of 2.0 g/cmor more and 2.8 g/cmor less. The transparent conductive layer has specific resistance of 1.1&#xd7;10&#x3a9;&#xb7;cm or more and 3.8&#xd7;10&#x3a9;&#xb7;cm or less.

In a conductive laminate, a transparent conductive thin film laminateincluding at least two transparent conductive thin films and a metal layerare formed in this order on at least one surface of a transparent base. In the transparent conductive thin film laminate, a first transparent conductive thin filmthat is closest to the metal layeris a metal oxide layer, or a composite metal oxide layer containing a principal metal and at least one impurity metal. Transparent conductive thin filmother than the first transparent conductive thin film is a composite metal oxide layer containing a principal metal and at least one impurity metal. The content ratio of impurity metal in the first transparent conductive thin film is not the highest of content ratios of impurity metal in the transparent conductive thin films which form the transparent conductive thin film laminate

Conductive laminate, transparent conductive laminate with patterned wiring, and optical device

A conductive film includes an elongated film base, a first conductive layer, a second conductive layer and a third conductive layer in this order. The elongated film base has a longitudinal direction and a width direction orthogonal to the longitudinal direction. The width direction dimension of the elongated film base is greater than or equal to 1 m. The first conductive layer is an indium-based oxide layer. The second conductive layer is a metal layer. The third conductive layer is an oxidized metal layer having a thickness of 1 nm to 15 nm formed by sputter deposition.

Growing community of inventors

Ibaraki, Japan

Nozomi Fujino