Applied Materials, Inc.

Noufal Kappachali

Martin Lee Riker

Adolph Miller Allen

Xiangjin Xie

Haitao Wang

Rui Li

Paul Kiely

Yida Lin

Methods and apparatus for processing a substrate are provided herein. For example, an RF power delivery compensation circuit comprises a first input configured to receive an RF forward power from an RF power source connected to a processing chamber and a second input configured to receive an RF delivered power from a matching network connected between the RF power source and the processing chamber. The RF power delivery compensation circuit calculates an RF forward power compensation factor based on the RF forward power and the RF delivered power for adjusting the RF forward power delivered to the processing chamber during operation.

Methods and apparatus for processing a substrate

Profile_ID files, containing proprietary hardware operating details of an originating user who originates a process recipe, are encrypted before dissemination of the process recipe to an end user. Blockchain technology is used to enable the end user to validate the encrypted process recipe and control uniform validated process across multiple chambers and locations.

Blockchain for distributed authentication of hardware operating profile

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Santa Clara, CA, United States of America

Noufal Kappachali