Asml Netherlands B.v.

Noud Jan Gilissen

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Koen Jacobus Johannes Maria Zaal

Erik Roelof Loopstra

Theodorus Petrus Maria Cadee

Edwin Johan Buis

Nicolaas Ten Kate

Harmen Klaas Van Der Schoot

Markus Franciscus Antonius Eurlings

Hernes Jacobs

Marcus Martinus Petrus Adrianus Vermeulen

Yim Bun P Kwan

Sjoerd Nicolaas Lambertus Donders

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Hans Jansen

Nicolaas Rudolf Kemper

Johannes Hubertus Josephina Moors

Michel Riepen

Henrikus Herman Marie Cox

Johannes Petrus Martinus Bernardus Vermeulen

Marco Koert Stavenga

Wilhelmus Josephus Box

Arnoud Willem Notenboom

Rene Theodorus Petrus Compen

Petrus Matthijs Henricus Vosters

Ronald Van Der Wilk

Jeroen Pieter Starreveld

Peter Paul Steijaert

Sebastiaan Maria Johannes Cornelissen

Jan Cornelis Van Der Hoeven

Eva Mondt

Roger Wilhelmus Antonius Henricus Schmitz

Anko Jozef Cornelus Sijben

Laurent Khuat Duy

David Christopher Ockwell

Manon Elise Will

James Kennon

Paulus H C M Schapendonk

Paulus Hcm Schapendonk

Harmen Klaus Van Der Schoot

Bas Cornelissen

Anko Sijben

Theodorus Cadee

A substrate handling system for an apparatus, the substrate handling system including a substrate table constructed to hold a substrate, a surrounding structure configured to surround the substrate, a sensor configured to determine a thickness of the substrate, and a control system configured to configure the apparatus responsive to a determination that the determined thickness is outside a thickness range associated with the surrounding structure.

Lithographic apparatus and device manufacturing method

A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck () for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus () by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (); a temperature conditioning fluid channel () formed within the chuck; a drive electrode () for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode () for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Chuck, a chuck control system, a lithography apparatus and a method of using a chuck

A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.

A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

A lithographic projection apparatus includes a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of a substrate, a support table including protrusions to support an article, a detector to detect height deviations of the protrusions, a material removing device arranged to modify a height of the protrusion material, a controller coupled between the detector and the material removing device, wherein material removing device includes a removal tool selected from the group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool.

Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system

An actuator is disclosed that includes a body, the body having a face, and a plurality of conduits located in the body, each conduit deformable in response to a change of pressure within the conduit, the deformation of the conduit configured to cause a deformation of the face.

Actuator

A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem includes one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P) on the substrate passing by the sensor during relative motion of the substrate and patterning subsystem under control of the positioning subsystem. A processor combines measurements of relative locations of a plurality of said marks to provide measurement results with an accuracy sufficient for the positioning subsystem to position at least a first substrate portion at said patterning location relative to said alignment marks. A preliminary step obtains position relative to a known pattern (M) on the patterning device. Measurements are taken and updated in real time during exposure of successive substrate portions.

Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate

A lithographic apparatus includes a movable first object, and a heat exchanger including a heat exchanging body, the heat exchanging body including a material with electro-caloric or magneto-caloric properties and configured to affect the temperature of the first object by exchanging heat with the movable first object, and a generator configured to supply an electromagnetic field to the heat exchanging body to change the temperature of the heat exchanging body in order to cool or heat the first object.

Lithographic apparatus and positioning apparatus

A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.

Substrate table, lithographic apparatus and device manufacturing method

An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.

A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck for supporting the object, a frame for supporting the chuck, and a chuck support structure for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element, which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.

A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.

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Eindhoven, Netherlands

Noud Jan Gilissen