Carl Zeiss Smt Gmbh

Norman Kretzschmar

Ulrich Mueller

Markus Holz

A method for generating a mathematical model (MM) for positioning individual mirrors (') of a facet mirror () in an optical system (), e.g. in a lithography apparatus (A,B). The method includes: a) providing (S) target positions (SP) of the individual mirrors (′) with an adjustment unit (), b) capturing (S) actual measurement positions (MI) of the individual mirrors (′) with a measuring device (), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S) a mathematical model (MM) for positioning the individual mirrors (′) based on the captured actual measurement positions (MI) and the target positions (SP). In step c), a difference (EA) is formed (S) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S) based on the difference (EA) formed.

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Aalen, Germany

Norman Kretzschmar