Carl Zeiss Smt Gmbh

Asml Netherlands B.v.

Norman Baer

Ulrich Loering

Markus Hauf

Guido Limbach

Holger Walter

Gero Wittich

Stefan Hembacher

Timo Laufer

Franz-Josef Stickel

Oliver Natt

Yim-Bun-Patrick Kwan

Jan Van Schoot

Peter Kuerz

Toralf Gruner

Hans-Juergen Mann

Rolf Freimann

Joachim Hartjes

Ralf Mueller

Thure Boehm

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

EUV exposure apparatus with reflective elements having reduced influence of temperature variation

The invention relates to an optical arrangement comprising: at least one optical element comprising an optical surface and a substrate, wherein the substrate is formed from a material whose temperature-dependent coefficient of thermal expansion at a zero crossing temperature &#x394;T=T&#x2212;Trelated to a reference temperature Tis equal to zero, wherein the optical surface has, during the operation of the optical arrangement, a location-dependent temperature distribution &#x394;T(x, y) that is dependent on a local irradiance (), is related to the reference temperature Tand has an average temperature &#x394;T, a minimum temperature &#x394;Tand a maximum temperature &#x394;T, wherein the average temperature &#x394;Tis less than the average value 1/2 (&#x394;T+&#x394;T) formed from the minimum temperature &#x394;Tand the maximum temperature &#x394;T, and wherein the zero crossing temperature &#x394;Tis greater than the average temperature &#x394;T.

Optical arrangement, EUV lithography apparatus and method for configuring an optical arrangement

A mirror (') with a substrate (S) and a layer arrangement configured such that light () having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0&#xb0; and 30&#xb0; is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P&#x2032;&#x2033;) having a periodic sequence of at least two periods (P) of individual layers, wherein the periods (P) include a high refractive index layer (H&#x2032;&#x2033;) and a low refractive index layer (L&#x2032;&#x2033;). The layer arrangement has at least one graphene layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objective

The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.

Imaging optics

Growing community of inventors

Aalen, Germany

Norman Baer