Other

Hitachi Displays, Ltd.

Noriyuki Ohroku

Yoichi Takahara

Hideaki Yamamoto

Hitoshi Oka

Susumu Aiuchi

Masahiro Yamada

Tomoaki Takahashi

Fumio Morita

Tomonori Saeki

Masataka Fujiki

Shoji Asaka

Yuichirou Tanaka

Akinobu Yamaoka

Hiroshi Kawanago

A cleaning apparatus according to the present invention is provided with a brush drive mechanism which brings a brush being rotating closer to a substrate, measures electrical potentials generated on a plurality of conductor patterns formed on the substrate, by a contact and separation with/from tips of scrub materials of the brush being rotating, and controls a positioning of the brush by use of the measurement results. With the process as described above, it is possible to treat uniformly a surface to-be-cleaned for a large-sized substrate, with the cleaning brush. Consequently, it is possible to form a highly qualified transistor for liquid crystal display on the substrate having been cleaned, with enhancing yield.

Surface treatment apparatus and method for manufacturing liquid crystal display device

At a time of cleaning a plate-like part such as a wafer or the like while rotating, for the purpose of reducing a contamination, a damage and an unevenness of process of the plate-like part which are caused by an amount of charged electricity of the plate-like part, chuck pins (chuck members) which chuck the plate-like part such as the wafer or the like and upper and lower cleaning plates and which oppose to the plate-like part are constituted by a resin material containing carbon powders, and a desired potential difference is applied to a portion between the plate-like part and the cleaning plates by a voltage control unit which is provided in an outer portion.

Cleaning apparatus for plate-like part and method thereof

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Yokohama, Japan

Noriyuki Ohroku