Other

Noriyuki Nakamura

Tadashi Matsunaga

Nobuyuki Murakami

Hiromichi Takahashi

Hitoshi Wake

Tsuruo Nakayama

Kin-ichi Ozawa

Toshihiro Takimoto

Hideo Kadoi

An electrochemical stain prevention apparatus of a submerged structure comprising a submerged structure of which at least the stain prevention surface is formed of a conductive film that does not generate chlorine even by applying a potential of 5 V vs. SCE or less, a counter electrode located so as not to contact with the submerged structure, and a power supply unit for passing a direct current through the submerged structure having the conductive film formed thereon and the counter electrode. Aquatic organisms adhered to the surface of the conductive film can effectively be controlled by applying a potential of from 0.1 to 5 V vs. SCE to the submerged structure of such a stain prevention apparatus without generating chlorine. A potential applied to the conductive film of the submerged structure can be controlled with good accuracy by disposing a reference electrode between the submerged structure and the counter electrode. As the conductive film formed on the substrate of the submerged structure, a sprayed coating film made of a metal nitride can preferably be used.

Electrochemical stain prevention apparatus of submerged structure and process for producing submerged structure used in this apparatus

Growing community of inventors

Koganei, Japan

Noriyuki Nakamura