Nagoya University

Toyota Jidosha Kabushiki Kaisha

Mitsubishi Gas Chemical Company, Inc.

Noritsugu Umehara

Takaaki Ogashiwa

Yousuke Matsuyama

Shigeru Horie

Takuya Hasaki

Hiroyuki Kousaka

Kazuyoshi Manabe

Shintarou Oyama

Kazuyuki Ichimura

Hitoshi Iida

Takayuki Tokoroyama

Provided are a hole formation method enabling the formation of a high-quality hole even when a workpiece material is a difficult-to-machining metal material or a fiber-reinforced composite material and a drill bit used in the method. A drill bit includes at least one cutting edge and a face (a leading flank and a trailing flank) positioned in the vicinity of the cutting edge, and on the face, a recess exhibiting a prescribed planar shape (groove) is provided. A hole formation method includes a hole formation step of machining a portion to be processed of a workpiece material by means of drilling to form a hole while a lubricant material for assisting machining process is in contact with the portion to be processed, and in the hole formation step, the drill bit is used.

Drill bit and hole formation method

In an amorphous carbon film of a sliding member, provided that a number of nitrogen atoms each singly bonded to three carbon atoms is A, and a number of nitrogen atoms each singly and doubly bonded to two carbon atoms, respectively, is B, a value A/B of the amorphous carbon film obtained through X-ray photoelectron spectroscopy analysis is 10 to 18. The method includes irradiating the surface of the substrate with nitrogen ion beams and irradiating a carbon target with electron beams, thereby forming an amorphous carbon film on the surface of the substrate while vapor-depositing a part of the carbon target onto the surface of the substrate. The output of the electron beams that irradiate the carbon target is 30 to 50 W.

Sliding member and method for producing the same

To generate plasma inside a tube of a small opening diameter and perform plasma processing inside the tube. A plasma processing deviceis formed by a chamber () and a microwave generation device (). A microwave is introduced into the chamber via a quartz tube (). A tube holder () is arranged inside the quartz tube (). Two holes are formed in the side surface of the tube holder (). A tube () of a small opening diameter is fixed to the end of the tube holder ().

Plasma processing device, plasma processing method, and plasma surface processing method

Growing community of inventors

Nagoya, Japan

Noritsugu Umehara