Ushio Denki Kabushiki Kaisha

Noritaka Ashizawa

Hironobu Yabuta

Tatsushi Igarashi

Christof Metzmacher

Hiroto Sato

Achim Weber

Rolf Theo Anton Apetz

Hermann Giese

A debris mitigation device includes a static foil trap. The static foil trap includes an enclosure section, a plurality of foils, an inlet hole, and a pressure-increasing mechanism. The enclosure section includes an incident opening where light emitted from the light source enters, an emission opening where the light is emitted, and an internal space where the light travels. The foils are fixed in an area of the internal space. The inlet hole is configured to be communicated with the internal space, and allow a transparent gas transparent to the light to flow into the internal space. The pressure-increasing mechanism includes at least one of an incident-side member and an emission-side member disposed at the incident opening and the emission opening, respectively, in a manner that opening areas thereof are reduced without blocking a traveling of the light, and increases a pressure of the internal space.

Debris mitigation device and light source apparatus including the same

An extreme ultraviolet light source apparatus includes a disc-shaped cathode rotating about an axis, a disc-shaped anode rotating about an axis, an energy beam irradiation device irradiating a plasma raw material on the cathode with an energy beam to vaporize the plasma raw material, a power supply for causing a discharge between the cathode and the anode for generating a plasma in the gap between the cathode and the anode to emit extreme ultraviolet light, and an irradiation position adjusting mechanism for adjusting a position at which the cathode is irradiated with the energy beam. The cathode, the anode, and the irradiation position adjusting mechanism are accommodated in a housing. A photography device is disposed outside the housing and is configured to photograph a visible-light image of a vicinity of the cathode and the anode, the vicinity including visible light emitted from the plasma.

Extreme ultraviolet light source apparatus and plasma position adjusting method

Disclosed herein a rotational type foil trap that is capable of avoiding the transmission rate of the EUV light to be lowered even when the EUV light source operates with the high input power and also suppressing the temperature increase of the foil to attain a sufficient life duration. In the rotational type foil trap, one end of each of foils is inserted into each of a plurality of grooves provided on a side face of a center support, and the center support and the each of the foils are fixed together by brazing.

Foil trap and light source device using such foil trap

Growing community of inventors

Yokohama, Japan

Noritaka Ashizawa