Cornell Research Foundation Inc.

Cornell University

Norimasa Yoshimizu

Amit Lal

Serhan Mehmet Ardanuc

Shankar Radhakrishnan

A wafer-scale nano-metrology system () for sensing position of a nanofabrication element () when illuminated by a patterned optical projection defining a grid or position measuring gauge includes a frequency stabilized laser emitter () configured to generate a laser emission at a selected frequency, where the laser emission forms a diverging beam configured to illuminate a selected area occupied by a target fabrication object () having a proximal surface. An optical pattern generator () is illuminated by laser () and generates a patterned optical projection grid or gauge for projection upon the target fabrication object (). A movable tool or nanofabrication element () carries an optical sensor array (), and the sensor array detect at least a portion of the optical projection grid, and, in response to that detection, generates grid position data for use in controlling the position of the tool ().

Optical grid for high precision and high resolution method of wafer-scale nanofabrication

A solid-state semiconductor device operable without loss arising from junction-to junction (e.g., source-to-drain) leakage current includes a movable MEMS switch or relay armature structure carrying at least one electrical contact corresponding to a semiconductor device junction. The switch or relay armature is movable from a first position corresponding to a first switch state to a second position corresponding to a second switch state. The semiconductor device also includes an actuation circuit configured to act on the cantilever switch, changing the switch from a first contact-conducting state to a second non-contact-conducting state by physically separating the switch's electrical contact from the semiconductor device junction, thus eliminating the conductive path for leakage current losses.

Growing community of inventors

Ithaca, NY, United States of America

Norimasa Yoshimizu