Nippon Steel Corporation

Nippon Steel & Sumikin Materials Co., Ltd.

Research Development Corporation of Japan

Nippon Steel Materials Co., Ltd.

Nittetsu Plant Designing Corporation

Kao Corporation

Dai Nippon Printing Co., Ltd.

Nippon Steel Chemical & Material Co., Ltd.

Tokyo Women's Medical College

Noriko Yamada

Yuji Kubo

Toyoshi Ogura

Kazunori Kataoka

Yasuhisa Sakurai

Tadashi Sakon

Toru Takahashi

Hiroyasu Fujii

Masayuki Yokoyama

Osamu Tanaka

Masayoshi Tanaka

Norikazu Fujii

Tomoji Kumano

Shohei Inoue

Shuji Nagasaki

Yoichi Matsuzaki

Kazufumi Hanzawa

Chikara Kaido

Koichi Nose

Teruo Okano

Yukihiro Yamamoto

Takeshi Hamada

Kazutaka Higashine

Atsushi Nogami

Shingo Katayama

Ikuko Shiina

Toru Nagai

Wataru Ito

Hitoshi Dohnomae

Takayuki Amiya

Akira Mamada

Keiko Kawakami

Akiko Amano

Sawako Yamaguchi

Sawako Ito

Problems to be Solved: To provide a metal foil coil with a planarization film, with which an electronic device can be formed by a roll to roll process. Solution: A quick curable coating liquid for a planarization film prepared by adding into an organic solvent, with respect to 1 mol of a phenyltrialkoxysilane, 0.1 mol to 1 mol of acetic acid and 0.005 mol to 0.05 mol of organic tin as a catalyst, hydrolyzing the silane with 2 mol to 4 mol of water, then distilling away the organic solvent at a temperature of 160&#xb0; C. to 210&#xb0; C. under reduced pressure to yield a resin, and dissolving the resin in an aromatic hydrocarbon solvent, is coated on a metal foil coil to a film thickness of 2.0 &#x3bc;m to 5.0 &#x3bc;m. When an insulation coating is provided on a metal foil coil before a planarization film is formed, high reliability for insulation can be obtained. When a stainless steel foil provided with a reflection film is used, a highly efficient light emitting device can be obtained.

Coating liquid for forming planarization film and metal foil coil with planarization film

The cleaning process of cleaning an imprinting mold including a release layer coupled via siloxane bonds to a substrate of that release layer includes a first cleaning step and a second cleaning step. In the first cleaning step, the angle of contact of the surface of the release layer with water is made small, and in the second cleaning step, the alkali cleaning agent is brought in contact with the release layer that has gone through the first cleaning step.

Process and apparatus for cleaning imprinting molds, and process for manufacturing imprinting molds

An insulating film-coated metal foil having on one or both surfaces thereof an organic-inorganic hybrid layer containing dimethylsiloxane and a metalloxane comprising a metal other than Si. Relative to the concentration [Si]of the Si at a depth of &#xbc;t from the surface of the organic-inorganic hybrid layer in the thickness direction of the hybrid layer, the concentration [Si]of the Si at a depth of &#xbe;t from the surface of the organic-inorganic hybrid layer in the thickness direction of the hybrid layer satisfies [Si]&#x3c;[Si], and ([Si]&#x2212;[Si])/[Si]is 0.02-0.23. Provided is a metal foil that can be used in solar cell substrates, flexible circuit substrates, etc., that exhibits surface flatness, pliability, insulating properties and thermal resistance properties, and that has a layer having a surface which is not susceptible to scratching by processes in which substrates are handled, such as conveyance and transshipment.

Insulating film-coated metal foil

The present invention provides stainless steel foil for flexible display use which enables fabrication of a TFT substrate for display use which is superior in shape recovery after being rolled up or bent and which is high in surface flatness and is characterized by having a thickness of 20 &#x3bc;m to 200 &#x3bc;m, a surface roughness Ra of 50 nm or less, and a shape recovery of a distortion angle of 10&#xb0; or less after being wound around a 30 mm diameter cylinder.

Stainless steel foil for flexible display use

An inorganic-organic hybrid film-coated stainless steel foil comprising a stainless steel foil substrate having coated on one surface or both surfaces thereof an inorganic-organic hybrid film, wherein the inorganic-organic hybrid film comprises a skeleton formed of an inorganic three-dimensional network structure mainly comprising a siloxane bond, with at least one crosslinked oxygen of the skeleton being replaced by an organic group and/or a hydrogen atom; and an inorganic-organic hybrid film-coated stainless steel foil comprising a stainless steel foil having coated thereon a plurality of inorganic-organic hybrid films each mainly comprising a siloxane bond, wherein at least a part of Si constituting each inorganic-organic hybrid film is chemically bonded to one or both of an organic group and hydrogen, provided that the uppermost layer out of the plurality of inorganic-organic hybrid films may be an inorganic SiOfilm, and adjacent films of the plurality of inorganic-organic hybrid films (including the inorganic SiOfilm) differ in the composition from each other.

Inorganic&#x2014;organic hybrid-film-coated stainless-steel foil

A coating solution for forming a flat-surface insulating film, which is a coating solution obtained by dissolving a poly(diorgano)siloxane A having a mass average molecular weight of 900 to 10,000 and a metal alkoxide B in an organic solvent C and further adding water, wherein the molar ratio A/B of the poly(diorgano)siloxane A to 1 mol of the metal alkoxide B is from 0.05 to 1.5, the organic solvent C has a hydroxyl group, the solubility of water in 100 g of the organic solvent C is from 3 to 20 g, and the molar ratio C/A of the organic solvent C to 1 mol of the poly(diorgano)siloxane A is from 0.05 to 100. This coating solution for forming a flat-surface insulating film ensures that an organic modified silicate composed of a poly(diorgano)siloxane and a metal alkoxide can be formed as a thick film having 1 &#x3bc;m or more and can be an organic modified silicate insulating film causing no irregularities due to phase separation and having a low Young's modulus and flexibility high enough to follow the deformation of a substrate board, as well as high film surface flatness allowing for mounting of microcomponents of an electronic device or the like.

Coating solution for forming flat-surface insulating film, flat-surface insulating film-coated substrate, and production method of a flat-surface insulating film-coated substrate

A means for treating the end faces of a core which is used for an electrical apparatuses and etc., to give insulation extremely superior in effect of improvement of the insulation, corrosion resistance, adhesiveness, heat resistance, and magnetic properties at a low temperature in a short time without cleaning for removing punching oil, annealing, or other pre-treatment; a core having an insulation coating comprised of a dry film of a pure silicone polymer, modified silicone polymer, and/or mixed silicone polymer as a silicone compound on the core end faces and having an average film thickness of at least 0.5 &#x3bc;m, a breakdown voltage of at least 30V, and a heat resistance in the air of at least 400&#xb0; C.; and a method of production comprised of forming a core, then dipping it in or spraying it by one or more types of a pure silicone polymer, modified silicone polymer, and/or mixed silicone polymer as an insulation coating.

Core having superior end face insulation and method of treating core end faces to give insulation coating

A ceramic composite with a mixed conducting oxide that has perovskite type crystal structure of {LnA}{BB'B&#x2033;}Owhere a, x, y, and z are within the range of 0.8&#x2266;a&#x2266;1, 0&#x3c;x, 0&#x3c;y&#x2266;0.5, 0&#x2266;z&#x2266;0.2, 0.98&#x2266;x+y+z&#x2266;1.02, and &#x3b4; denotes a value that is determined so as to meet a charge neutralization condition. A denotes a combination of one or more kinds of elements selected out of Ba, Sr, and Ca. B denotes a combination of one or more kinds of elements selected out of Co, Fe, Cr, and Ga, the combination always containing Fe or Co. B&#x2032; denotes a combination of one or more kinds of elements selected out of Nb, Ta, Ti, and Zr, the combination always containing Nb or Ta. The present invention is also directed to a mixed conducting oxide and a ceramic composite. The mixed conducting oxide is of formula AFeOA is selected out of Ba, Sr, and Ca, and is within the range of 0.98&#x2266;x&#x2266;1.02, and &#x3b4; denotes a value determined so as to meet the charge neutralization conditions.

Ceramic composition, composite material, composite material production method, porous body, oxygen separator, and chemical reactor

Silica-based low dielectric constant materials having three-dimensional network structures containing siloxane backbones which comprise SiO tetrahedron structural units, as well as their production and use. The materials can be applied as interlayer dielectrics for semiconductor elements and the like.

Low dielectric constant materials and their production and use

This invention is a water-soluble high molecular polymerized drug comprising a water-soluble clock copolymer having a hydrophilic segment and a hydrophobic pharmacological-functioning segment to side chain of which a drug is bonded. The hydrophilic first segments of the present invention include polyethylene glycol, polysaccharides, polyacrylamide, and so on. The hydrophobic segments being attached to a drug include polyaspartic acid, polyglutamic acid, polylysine, or derivatives thereof. Drugs to be attached to the hydrophobic segment include anti-cancer drugs, drugs for central nerve, drugs for circulatory organs, and so on.

Water soluble high molecular weight polymerized drug preparation

An optical waveguide second harmonic generating element comprises a KTP single-crystal substrate sliced at a z-plane, a plurality of polarization reversal areas having spontaneous polarization, whose direction is reversed, and formed periodically along a predetermined direction on the z-plane of the substrate, and a channel waveguide, extending along the predetermined direction across polarization reversal areas, for propagating a light.

Optical waveguide second harmonic generating element and method of

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Tokyo, Japan

Noriko Yamada