Kioxia Corporation

Toshiba Memory Corporation

Noriko Sakurai

Hideaki Sakurai

Ryu Komatsu

Takeharu Motokawa

Kosuke Takai

Shingo Kanamitsu

According to one embodiment, a pattern forming method includes forming an organic film on a processing target material, the organic film comprising a convex part and a remaining film part adjacent to the convex part and thinner than the convex part. The method further includes irradiating the organic film with an electron beam to decrease a dry etching rate of the organic film. The method further includes removing the remaining film part by dry etching of the organic film. The method further includes forming a pattern on the processing target material by dry etching using the organic film from which the remaining film part has been removed as a mask.

Pattern forming method, combined processing apparatus, and recording medium

A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.

Method of manufacturing template and method of forming pattern

A template according to the present embodiment is a template used in a lithography process of a semiconductor manufacturing process. A first substrate includes a first face, a second face protruded from a portion of the first face, and a lateral face being a lateral face positioned between the second face and the first face and inclined with respect to the second face at a connection portion to the second face. A first material film is provided at least on the lateral face.

Template, manufacturing method of template

A method for processing a substrate includes forming a pattern on a substrate, supplying water to cover the pattern, and after the supplying the water, irradiating the pattern with light having a wavelength longer that which causes dissociation of water. A substrate processing apparatus of an embodiment includes a transfer chamber to receive a patterned substrate, a water supplying chamber to cover the pattern with water, and an irradiating chamber to irradiate a portion of the pattern with near-field light.

Substrate processing method and substrate processing apparatus

According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.

Pattern forming method and template manufacturing method

A pattern forming method comprises forming a line pattern in a first film. The line pattern includes a first pattern part including feature portions at a first dimension and a second pattern part adjacent to the first pattern part and including feature portions at a second dimension smaller than the first dimension. A second film is formed on the substrate conformally over the first film. The second film is etched to expose a top surface of the first pattern part and remove the second pattern part. The remaining first film is then removed, leaving portions of the second film that were formed on sidewalls of the first pattern part. The substrate is then processed by using those portions of the second film left after the removal of the first film as a mask.

Growing community of inventors

Yokohama Kanagawa, Japan

Noriko Sakurai