Kabushiki Kaisha Topcon

Topcon Corporation

Noriko Saito

Tsuyoshi Yoshida

Akio Kobayashi

Hiroyuki Kawashima

Ryosuke Tomizawa

Sora Otaguro

Atsushi Ohyama

A fertilization design device calculates a fertilization amount of a field to be fertilized and includes the following units. A database reception unit receives one or both of growth data indicating growth potential of the field and soil data indicating plant growth potential of soil in the field and receives position data as position coordinate information for the field. A designated position reception and retrieval unit receives a freely selected position designated by a user and retrieves information of the freely selected position from the position data. A user input fertilization amount value reception unit receives a fertilization amount value freely set by the user for the freely selected position or for a range including the freely selected position. A calibration curve generation unit generates a calibration curve, based on one or both of the growth data and the soil data, the position data, and the fertilization amount value.

Fertilization design device, agricultural tool, fertilization design method and fertilization design program

A technique is provided to enable low-cost control of amounts of fertilizer applied. A control device controls a currently used agricultural machine that applies fertilizer to a crop while traveling through a field. The control device includes a growth data receiving unit, a fertilizer application amount value calculator, and a speed signal generator. The growth data receiving unit receives growth data that is obtained by sensing a growth condition of a crop at each location in the field. The fertilizer application amount value calculator determines an amount of fertilizer on the basis of the growth data. The speed signal generator generates a speed signal to cause the agricultural machine to travel at a speed corresponding to a variable value of an amount of the fertilizer to be applied at each location in the field.

Device, method, and program for controlling agricultural machine

A location identifying device includes an image data receiving part that receives data of a photographed image of a field taken from the air, and a location data receiving part that receives data of location, which is measured on the basis of navigation signals from a navigation satellite by a location measuring device while a mobile body having the location measuring device moves along a predetermined path set for the field. The location identifying device also includes a first shape data detecting part that detects a shape of the predetermined path from the photographed image data, a correspondence relationship determining part that determines a correspondence relationship between the shape of the path detected by the first shape data detecting part and the location data, and a field location identifying part that identifies a location of the field contained in the photographed image by referring to the determined correspondence relationship.

Location identifying device, location identifying method, and program therefor

A wavefront aberration compensating apparatus includes: a deformable mirror which compensates a wavefront aberration of a light flux entered, the deformable mirror including a plurality of electrodes, and a thin-film mirror which changes a configuration thereof in accordance with a voltage value applied to each of the electrodes; an optical system provided with the deformable mirror, and including an object subjected to aberration compensation; a wavefront sensor which receives the light flux traveled through the object and the deformable mirror, and which measures the wavefront aberration of the light flux; and a controller configured to calculate the voltage value applied to each of the electrodes, on the basis of differences, from a signal outputted from the wavefront sensor, between application points on the thin-film mirror and target points both corresponding to the electrodes, respectively, and to repeat compensation of the configuration of the thin-film mirror of the deformable mirror on the basis of the calculated voltage value, such that the wavefront aberration of the light flux measured by the wavefront sensor is suppressed.

Wavefront aberration compensating apparatus and opthalmologic unit having the same

A wavefront aberration compensating apparatus, which includes: a deformable mirror having electrodes and a thin-film mirror; an optical system provided with the deformable mirror and including an object; a wavefront sensor which measures a wavefront aberration of a light flux; and a controller configured to: calculate a first voltage value applied to each of the electrodes, on the basis of differences between application points on the thin-film mirror and target points both corresponding to the electrodes respectively; determine a superposition amplitude value of each expansion mode according to a polynomial of wavefront aberration, and calculate a second voltage value applied to each of the electrodes by using voltage templates previously stored, such that the wavefront aberration obtained by the wavefront sensor becomes a desired aberration; determine the voltage value applied to each of the electrodes, by mainly using the second voltage value in an initial stage of compensation of the configuration of the thin-film mirror and by mainly using the first voltage value in an end stage of the compensation; and repeat the compensation on the basis of the determined voltage value, such that the wavefront aberration of the light flux is suppressed.

Wavefront aberration compensating apparatus and ophthalmologic unit having the same

A wavefront aberration compensating apparatus, including: a deformable mirror which compensates a wavefront aberration of a light flux and includes electrodes, and a thin-film mirror which changes a configuration thereof in accordance with a voltage value applied to each of the electrodes; an optical system provided with the deformable mirror and including an object subjected to aberration compensation; a wavefront sensor which measures the wavefront aberration of the light flux; a memory which stores therein a voltage template provided for each expansion mode according to a polynomial of wavefront aberration, as a voltage alignment data for the electrodes which induces the corresponding expansion mode; and a controller configured to determine a superposition amplitude value of each of the expansion modes and calculate the voltage value applied to each of the electrodes by using the voltage templates stored such that the wavefront aberration obtained by the wavefront sensor becomes a desired aberration, and to repeat compensation of the configuration of the thin-film mirror on the basis of the calculated voltage value, such that the wavefront aberration of the light flux measured by the wavefront sensor is suppressed.

Growing community of inventors

Tokyo, Japan

Noriko Saito