Sumitomo Metal Mining Company, Ltd.

Noriko Ishiyama

Yoshiyuki Abe

Go Ohara

A transparent oxide electrode film is provided to have crystalline indium oxide as its main component in which the indium in the indium oxide is substituted with titanium at a titanium/indium atomic ratio between 0.003 and 0.120, and the resistivity of the transparent oxide electrode film is 5.7&#xd7;10&#x3a9;cm or less, so as to provide excellent transmittance for both the visible light region and the infrared light region, and low resistivity.

TI and W containing transparent oxide electrode film

A transparent oxide electrode film is provided to have crystalline indium oxide as its main component, in which the indium in the indium oxide is substituted with titanium at a titanium/indium atomic ratio between 0.003 and 0.120, and the resitivity of the transparent oxide electrode film is 5.7&#xd7;10&#x3a9;cm or less, so as to provide excellent transmittance for both the visible light region and the infrared light region, and low resistivity.

Transparent oxide electrode film and manufacturing method thereof, transparent electroconductive base material, solar cell and photo detection element

An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 k&#x3a9;m or less.

Oxide sintered body and sputtering target, and manufacturing method for transparent conductive oxide film as electrode

An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 k.cm or less.

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Ichikawa, Japan

Noriko Ishiyama