Rohm Co., Ltd.

Japan Science and Technology Agency

Other

Ngk Insulators, Inc.

Osaka University

Jx Nippon Oil Energy Corporation

Norikazu Nishiyama

Korekazu Ueyama

Yoshiaki Oku

Yoshiaki Uchida

Akira Kamisawa

Masaki Takaoka

Chikanori Nakaoka

Koichi Matsushita

Takeru Omiya

Shunsuke Tanaka

Yasuyuki Egashira

Takuto Nakai

Koki Sasaki

The invention provides a method for producing sheet-like particles of zeolite that cannot be obtained by a top-down method, and provides sheet-like particles of zeolite having an 8-membered oxygen ring structure obtained by the method. A thickness of the sheet-like particles is 1 nm to 100 nm, and an aspect ratio (maximum width/thickness in particles) of the sheet-like particles is 100 or more.

Sheet-like particles of zeolite and method for producing same

The present disclosure provides a method for producing a metal organic framework nanosheet, including forming a metal organic framework in a sheet form between two monolayers constituting a single bilayer membrane in a case where the bilayer membranes form a hyper-swollen lamellar phase in a solvent. The present disclosure relates to a metal organic framework nanosheet including a metal organic framework disposed, in a sheet form, between two monolayers constituting a single bilayer membrane, wherein a plurality of the bilayer membranes forms a hyper-swollen lamellar phase in a solvent.

Metal organic framework nanosheet and method for producing same

This invention relates to a method wherein a high-purity paraxylene can be produced efficiently by using a catalyst having a molecular sieving action (or shape selectivity) and being excellent in the catalytic activity without isomerization and adsorption-separation steps. More particularly, it relates to a method of producing a high-purity paraxylene, characterized in that MFI type zeolite having a primary particle size of not more than 100 &#x3bc;m, a structure defining agent and silica material having an average particle size of not less than 10 nm but less than 1.0 &#x3bc;m are used as a starting material, and a synthetic zeolite catalyst produced by subjecting the MFI type zeolite to a coating treatment with an aqueous solution obtained by mixing so as to satisfy X&#xd7;Y&#x3c;0.05 (wherein X is a concentration of the silica material (mol %) and Y is a concentration of the structure defining agent (mol %)) is used in the alkylation or disproportionation of at least one of benzene and toluene as a starting material.

Method of producing synthetic zeolite catalyst and method of producing high-purity paraxylene with a catalyst produced by such a method

An electroconductive porous film high in the porosity and strong in the mechanical strength is provided. A mesoporous thin film of the invention, in which a crosslinking structure having a metal phosphate (M&#x2014;PO) skeleton is arranged so as to surround periodically arranged pores, is formed by use of a process that includes: a step of preparing a precursor solution containing phosphoric acid and a surfactant; a step of supplying the precursor solution to a substrate to form a precursor thin film; a step of bringing vapor containing a metal into contact with the precursor thin film obtained in the forming the thin film; a step of reacting the vapor containing a metal and phosphoric acid to form a self-organized thin film; and a step of removing the surfactant from the self-organized thin film.

Mesoporous thin film and method of producing the same

The invention is characterized by attaining a lower dielectric constant and including an inorganic dielectric film which is formed on the surface of a substrate and has a cyclic porous structure having a pore ratio of 50% or higher.

Semiconductor device, and method for manufacturing the same

There is included an inorganic insulating film having a porous structure including a cylindrical vacancy oriented in parallel with the surface of a substrate subjected to a hydrophilic treatment or a hydrophobic treatment.

Semiconductor device and method of manufacturing the same

The invention aims at providing a dielectric film having a low dielectric constant and enhanced mechanical strength. A surfactant and an silica derivative are dissolved into a solvent at a desired mole ratio. The precursor solution is applied over the substrate, and the substrate is exposed to a silica derivative atmosphere before being sintered, thereby supplying a silica derivative. Thus, contraction of the film stemming from hydrolysis is inhibited, and a sturdy mesoporous silica thin film which takes the self-assembly of the surfactant as a mold is obtained while cavities are maintained intact without being fractured. Thus, there is formed an inorganic dielectric film which is formed on the surface of the substrate and has a cyclic porous structure including layered or columnar pores oriented so as to become parallel with the surface of the substrate.

Production method for semiconductor device

It is an object to provide, with a high productivity, a dielectric thin film having a high degree of pore and a very great mechanical strength, and there are included a surfactant film forming step of forming a film including a surfactant on a surface of a substrate on which a thin film is to be formed, a vapor deposition step of causing the substrate to come in contact with a gas phase containing a silica derivative to form a thin film including the silica derivative, and a step of calcining the substrate having the thin film formed thereon and decomposing and removing the surfactant, the thin film being thus formed.

Method for forming thin film

Semiconductor device and production method therefor

A mesoporous silica has uniform mesopores and a periodic structure, which contains a Zr element in the form of a Si&#x2014;O&#x2014;Zr bond and wherein the Zr content in the Si&#x2014;O&#x2014;Zr bond, represented by [Zr/(Si+Zr)] is 0.05 to 20 mole %. The mesoporous silica is superior in alkali resistance and is suitably used particularly as a separation membrane (e.g. a ceramic membrane) and a catalytic support for solid-liquid system, in which an alkaline liquid may be used.

Growing community of inventors

Toyonaka, Japan

Norikazu Nishiyama