Nisshin Steel Co., Ltd.

Primetals Technologies Japan, Ltd.

Norikatsu Kakemizu

Hideaki Suemori

Masayoshi Tanaka

Hisao Morishita

Ryuuichi Yamashita

Takashi Yamamoto

The present invention is provided with: a duct of which one end interconnects to a wiping nozzle () and the other end is open; a first valve () that controls the actual gas pressure (P') of the wiping nozzle (); a second valve () that controls the gas flow rate (Q) dissipating to outside the system from another branched duct; a wiping pressure setting unit () that sets the set gas pressure (P) of the wiping nozzle (); a first valve aperture setter () that sets the valve aperture of the first valve (); a second valve aperture setter () that sets the valve aperture of the second valve (); and a computation processing unit () that presents to the first valve aperture setter () the valve aperture at which the gas pressure (P&#x2032;) matches a set gas pressure (P), and presents to the second valve aperture setter () the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device () becomes uniform.

Growing community of inventors

Hiroshima, Japan

Norikatsu Kakemizu