Dai Nippon Printing Co., Ltd.

Norihito Itoh

Tomoyuki Tachikawa

Kiyoshi Itoh

Yasuhiro Iizumi

A method of producing an organic EL element that allows easier patterning of the organic EL layer and reduction of the damage of the electrode layer caused by the organic EL layer and is superior in emission characteristics. Also provided is an organic electroluminescence element, including a substrate, a first electrode layer, a wettability variable layer, an organic EL layer, and a second electrode layer sequentially laminated. The wettability variable layer changes its wettability under the action of a photocatalyst caused by energy irradiation, is inactive to the energy, and has on the surface, a wettability variable pattern having an organopolysiloxane-containing lyophilic region and a liquid repellent region containing a fluorine-containing organopolysiloxane.

Organic electroluminescence element and production method thereof

There is provided a process for producing an EL element by photolithography, which process can produce an EL element having improved luminescence efficiency. The production process comprises the steps of removing a photoresist from photoresist layer-covered parts of an electroluminescent layer and cleaning the surface of the electroluminescent layer parts from which the photoresist has been removed.

Process for producing electroluminescent element

A process of producing an electroluminescent element is provided. The production process comprises repeating at least twice a step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer. The method includes the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer, and coating a solution for forming a second buffer layer in a region including the first pattern part. The first buffer layer is immiscible with the solution for forming the second buffer layer.

Process for production of electroluminescent element and electroluminescent element

Disclosed are a light emitting element that, in the formation of a plurality of luminescent layers, can effectively suppress color mixing in each luminescent layer and loss in dissolution of the luminescent layer per se, and a process for producing the same. The light emitting element comprising a plurality of luminescent layers formed by photolithography is produced by a process which comprises: forming a first electrode on a surface of a base material; forming a first luminescent layer on the first electrode; conducting treatment for rendering the first luminescent layer in its exposed area insoluble in a coating liquid for second luminescent layer formation; forming the second luminescent layer on the first electrode; repeating the steps a plurality of times to form a plurality of luminescent layers on the first electrode; and forming a second electrode on the plurality of luminescent layers.

Light emitting element and process for producing the same

A cholesteric liquid crystal coating film &prime; is formed on an alignment layer provided on a glass substrate (FIG. ( )), and is subjected to a thermal alignment process at a temperature equal to or higher than the liquid crystalline phase transition temperature of a chiral nematic liquid crystal that constitutes the coating film (FIG. ( )). Active rays capable of activating optically active groups in the chiral nematic liquid crystal are applied to the cholesteric liquid crystal coating film &prime; to deactivate the optically active groups, thereby forming a cholesteric layer having color-indicating regions with the desired areas and indication colors that have been created according to the active-rays-applied area and to the amount of active rays applied to the area (FIG. ( )). Thereafter, this cholesteric layer is subjected to a thermal alignment process at a temperature lower than the liquid crystalline phase transition temperature of the chiral nematic liquid crystal (FIG. ( )). Lastly, a predetermined amount of ultraviolet light was applied to the cholesteric layer in an atmosphere in which the optically active groups are inactive, thereby three-dimensionally crosslinking the cholesteric layer for curing (FIG. ( )).

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Tokyo-to, Japan

Norihito Itoh