Dai Nippon Printing Co., Ltd.

Other

Norihito Ito

Nobuyuki Ito

Tomoyuki Tachikawa

Keisuke Nakazawa

Chiaki Hatsuta

Naoya Hayashi

Toshiaki Motonaga

Toru Ogawa

Takahiro Matsuo

Toshio Onodera

Toru Miyake

Hironori Kobayashi

Yoshihiro Kobayashi

Hiroshi Mohri

Kiyoshi Itoh

Junji Fujikawa

Shinichi Handa

Yasuhiro Iizumi

There is provided a pattern formed object having an electroluminescent layer coating. The pattern formed object comprising a substrate, partition walls provided on the substrate, and a coating stacked on the substrate in its part between the partition walls, wherein the partition walls have a sloped liquid non-repellent surface and have a section form that, at least in the lower part of the partition wall, as the distance from the substrate increases, the size of the partition wall in a direction parallel to the substrate decreases, and in the coating, the ratio of the maximum thickness (Tmax) to the minimum thickness (Tmin), Tmax/Tmin, is not more than 130% as measured in the coating in its part between the lower ends of the partition walls adjacent to each other.

Pattern formation method for electroluminescent element

A main object of the present invention is to provide an organic EL element having members such as an organic EL layer formed highly precisely in a pattern with preferable light emission characteristic of the organic EL layer, and a photocatalyst containing coating solution to be used for the production thereof. To achieve the object, the present invention provides an organic electroluminescent element comprising: a substrate; a first electrode layer formed on the substrate; an organic electroluminescent layer formed on the first electrode layer; and a second electrode layer formed on the organic electroluminescent layer, wherein a photocatalyst containing layer containing a photocatalyst, a characteristic providing agent, and a light emission characteristic improving material having the function of improving the activation of the photocatalyst and the light emission characteristic of the organic electroluminescent layer so as to have the characteristic of the characteristic providing agent changed by the action of the photocatalyst accompanied by the energy irradiation is formed at any position between the substrate and the second electrode layer; and the light emission characteristic improving material is a silver salt of a fluorine or an acid selected from the group consisting of carboxylic acids, sulfonic acids, sulfinic acids, phenols, enols, thiophenols, imides, oximes, primary or secondary nitro compounds, clathrate compounds, a chloric acid and a perchloric acid.

Organic electroluminescent element and photocatalyst containing coating solution for organic electroluminescent element

The present invention provides a method for manufacturing an EL element including an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer, a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

Production method for electroluminescent element

A pattern formed object for an electroluminescent element includes a substrate; partition walls provided on the substrate; and a coating stacked on the substrate in its part between the partition walls. The partition walls have a sloped liquid-nonrepellent surface and have such a sectional form that, at least in the lower part of the partition wall, as the distance from the substrate increases, the size of the partition wall in a direction parallel to the substrate decreases, and, in the coating, the ratio of the maximum thickness (Tmax) to the minimum thickness (Tmin), Tmax/Tmin, is not more than 130% as measured in the coating in its part between the lower ends of the partition walls adjacent to each other.

Pattern formed object for an electroluminescent display

An EL element capable of: preventing the state in which number of excessive layers are laminated on each light emitting part formed in a pattern at the time of forming the light emitting parts using the photolithography method; executing the peeling treatment easily and quickly in the excessive layer peeling process; and preventing generation of color mixture or pixel narrowing derived from the elution of the patterned light emitting part into the light emitting layer coating solution to be coated later, at the end part thereof, at the time of coating a light emitting layer coating solution. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an electroluminescent element using a photolithography method.

Method for manufacturing electroluminescent element

The present invention provides a method for manufacturing an EL element, capable of preferably carrying out the peeling operation at the time of peeling off an unnecessary layer such as a photoresist layer. This object is achieved by providing a method for manufacturing an EL element comprising: an organic EL layer forming process of forming an organic EL layer on a substrate, on which at least an electrode layer is formed; a peeling layer forming process of forming a peeling layer on the organic EL layer; a photoresist layer forming process of forming a photoresist layer on the peeling layer; a photoresist layer patterning process of patterning the photoresist layer by exposing and developing; an organic EL layer developing process of removing the organic EL layer of a part not covered with the photoresist layer; and a peeling layer peeling process of removing the photoresist layer laminated thereon by peeling off the peeling layer.

The main object of the present invention is to provide a method for manufacturing an EL element, capable of preventing deterioration of the element characteristic by the developing agent or the rinsing agent, while providing the advantages of the photolithography method of high light emitting efficiency and taking out efficiency, the manufacturing process simplicity, and the highly sophisticated pattern formation. In order to achieve the above mentioned object, the present invention provides a method for manufacturing an organic EL element comprising at least a patterned organic light emitting layer, wherein the patterning is conducted by etching with a protecting layer pattern laminated on an organic light emitting layer.

Method for fabricating organic EL element

A method and apparatus for manufacturing an EL layer of uniform thickness, causing effective light emission of pixel openings and manufacturing an organic EL display showing sufficient brightness and excellent in practicability, by an ink jet method. A method and apparatus for manufacturing a color filter excellent in practicability by an ink jet method, in which a dye layer with uniform thickness is formed and optical coloring of uniform tone is conducted at pixel openings. The method includes: a process of discharge-placing at least an organic EL material in the form of solution on a substrate; and a process of drying the organic EL material in the form of ink placed on the substrate by heating, and the organic EL material is dried by heating over thereof.

Method and apparatus for manufacturing organic EL display and color filter by ink jet method

An organic electroluminescent display which has excellent partiality, and which includes a substrate, an electrode provided on the substrate, and protrusions provided on the substrate so as to cover the ends of the electrode and convexly curved in section relative to the surface of the substrate. An electroluminescent layer is provided in each opening which is located on the electrode and defined by adjacent protrusions. The electroluminescent layer in its part around the boundary between the electroluminescent layer and the protusion is in contact with the protrusion can be in such a state that the electroluminescent layer is curved in section in a direction opposite to the convexly curved protrusion.

Electroluminescent display and process for producing the same

The present invention relates to an electroluminescent (EL) element comprising at least a substrate, an electrode formed on the substrate and an electric light emitting layer and to a display using this element as pixel unit. The object of the present invention is to provide a display without property deterioration due to heating of the EL layer or remaining of the solvent, and is practical though the thickness of the film is uneven. A display comprising the electroluminescent element, wherein the light emitting region is changed by the applied voltage, as a pixel unit wherein the display is driven by a digital gradation driving method in which a low voltage value at which the pixel dose not emit light is a non-selected state, and a high voltage value at which the light emitting region within the pixel is saturated is a selected state. By using the present invention, though the film thickness is not even, a practical display with excellent gradation control property can be provided.

Electroluminescent element and display

A method for manufacturing an electroluminescent element includes forming a hole injecting layer on a first electrode layer a base material with the first electrode layer formed in a pattern; a decomposition removing process of using a photocatalyst treatment layer substrate having at least a photocatalyst treatment layer, placing the base material and the photocatalyst treatment layer substrate facing each other with a gap of 200 &#x3bc;m or less, decomposing and removing the hole injecting layer, in a pattern, on the base material by irradiating from predetermined direction; forming a light emitting layer on the pattern formed hole injecting layer remaining on the base material; and forming a second electrode layer on the light emitting layer; wherein a contact angle to a liquid of the surface of the hole injecting layer is smaller than the contact angle to a liquid of the surface bared by removing the hole injecting layer.

In a halftone phase shifting photomask , having a pattern of halftone phase shifting film containing at least chromium and fluorine, the halftone phase shifting film is heat-treated at a temperature between 250&deg; C. and 500&deg; C. so that a change of the optical property of the film produced by the application of excimer laser for exposure to the film is decreased.

Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomask

The invention relates to a halftone phase shift photomask whose transmittance and phase angle remain unchanged even when irradiated with an excimer laser used for exposure over an extended period of time, and a blank therefor, and provides a halftone phase shift mask comprising a pattern of halftone phase shift film containing at least chromium and fluorine on a transparent substrate , wherein optical characteristic changes upon irradiation with an exposure excimer laser have been reduced by patterning a film irradiated with light having a wavelength substantially absorbed by halftone phase shift film

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Tokyo, Japan

Norihito Ito