Fuji Photo Film Company, Limited

Fujifilm Corporation

Norihisa Takada

Takeshi Fujii

Yasuhiko Kachi

Masaki Kataoka

Tadashi Suzuki

Yoji Okazaki

Hiroshi Inoue

John A Higginson

Hiromi Ishikawa

Kevin Von Essen

Katsuto Sumi

Takao Ozaki

Tsutomu Yokouchi

Morimasa Sato

Daisuke Nakaya

Michael J Rocchio

Takayuki Uemura

Yoshihira Rai

Satoshi Mino

Takaaki Sekiyama

Masahiro Ohba

Yutaka Korogi

Steve Deming

Yuji Shimoyama

Mitsutoshi Tanaka

Atsumichi Imazeki

Michael Rocchio

Provided are a liquid jetting head and a liquid jetting device that prevent contamination of a humidity sensor. The liquid jetting head and the liquid jetting device include a nozzle that jets a liquid; a humidity sensor that is disposed further inside than the nozzle face where the nozzle is disposed; an air intake port that is disposed on the same plane as the nozzle face; a connection passage that allows the air intake port and the humidity sensor to communicate with each other; and a contamination preventing part that prevents contamination of the humidity sensor.

Liquid jetting head and liquid jetting device

The present invention provides a recording head, a recording head adjusting system, and a recording head adjusting method. A recording head includes: a head module having a recording surface; a support member that supports the head module; a first direction position adjusting unit that adjusts the first-direction position of the head module; a rotation direction adjusting unit that adjusts the angular deviation of the rotation direction; and a position detection unit that detects the first-direction position of the head module that is used when performing adjustment by the first direction position adjusting unit and the rotation direction adjusting unit. The rotation direction adjusting unit includes a rotation support mechanism for rotatably supporting the head module within the plane parallel to the recording surface and a second direction moving mechanism for moving the adjustment position of the head module in a second direction perpendicular to the first direction.

Recording head, recording head adjusting system, and recording head adjusting method

A bracket includes a support strut configured to carry the fluid ejection module and an alignment strut coupled to the support strut. The alignment strut is configured to affix to the frame so as to orient the support strut with respect to the frame in each of three orthogonal linear directions and three orthogonal angular directions. The alignment strut includes three alignment mechanisms. Each of the first and second alignment features is held mechanically fixed on the alignment strut in a respective aligned position, and the third alignment mechanism is movable on the alignment strut.

Fluid ejection module mounting

A nozzle surface cleaning apparatus wipes a nozzle surface of a droplet ejection head. The apparatus includes: a wiping member which wipes the nozzle surface in which a nozzle aperture is formed; a head movement device which causes movement of the droplet ejection head in a head movement plane and in a head movement direction; and a fine vibration device which causes vibration of one of the wiping member and the droplet ejection head in a vibration plane and in a vibration direction, the vibration plane being parallel to the head movement plane, the vibration direction being different to the head movement direction.

Nozzle surface cleaning apparatus, maintenance method using same, and droplet ejection apparatus

A belt-like work () provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section () illuminates a photomask () in an exposure period T synchronized with the work conveying speed V. The photomask () is disposed at a proximity gap from the belt-like work (). Mask patterns () on the photomask () are exposed on the belt-like work () to form periodic patterns thereon.

Pattern exposure method and pattern exposure apparatus

Printer

Inkjet recording device

A pixel position specifying method in an image forming device, the method measuring positions of exposure beams of the respective exposure heads and specifying pixel positions of junctures of the exposure heads, the method includes: using a beam position detecting mechanism to measure the positions of the exposure beams; detecting a first exposure beam position on an image receiving surface provided at the beam position detecting mechanism, by turning on a first connecting pixel near a juncture of a first exposure head; detecting a second exposure beam position on the image receiving surface, by turning on a second connecting pixel near a juncture of a second exposure head and moving the beam position detecting mechanism in the Y axis direction; and specifying connecting pixel positions from a moving amount of the beam position detecting mechanism in the Y axis direction and positions of exposure beams of the exposure heads.

Pixel position specifying method, method of correcting image offset, and image forming device

Light modulated by a spatial light modulator is projected onto photosensitive material and the photosensitive material is exposed to light in a predetermined pattern. The action of the spatial light modulator is controlled so that the amount of the light projected onto the photosensitive material is changed in at least two stages according to the part of the photosensitive material.

Exposure method and exposure system

A light beam emitted from a light source passes through a spatial light modulation device, at which a plurality of unit elements for respectively modulating incident light beam are two-dimensionally arrayed, and a microlens array, at which a plurality of microlenses corresponding to the unit elements are arrayed, and is focused on an exposure surface. A four-part detector, which is structured by four diodes, is disposed on the exposure surface so as to correspond to four pixels which are present at one corner of the exposure area. Relative mispositioning between the spatial light modulation device and the microlens array generates a difference in respective detection signals of the four diodes. Thus, an offset between the spatial light modulation device and the microlenses can be detected. Positional adjustment of the microlens array is performed on the basis of a detected offset amount.

Exposure device

A spatial light modulator performs spatial light modulation of light produced by a light source. An image-side telecentric image forming optical system forms an image of a two-dimensional pattern of the light, which has been obtained from the spatial light modulation, on a photosensitive material. An axial air separation adjusting section is located between the image forming optical system and the photosensitive material. The axial air separation adjusting section alters an axial air separation between the image forming optical system and the photosensitive material and thereby adjusts a focusing point at the time of the formation of the image of the two-dimensional pattern of the light.

Projecting exposure apparatus

A method for correcting recording positions of light beams scanned by a light beam scanning apparatus, in which at least one of plural light beams is deflected by an optical deflecting device and all the plural light beams are combined and scanned by a common scanning optical system. The beam position correction data for the optical deflecting device for keeping positions of the light beams constant is obtained by detecting the beam positions before the scanning optical system. The recording positions of respective light beams on a recording surface is also detected to obtain an additional correction data for correcting deviations of the recording positions due to uneven optical power distribution of the light beam or astigmatism of the scanning optical system. The additional correction data is added to the beam position correction data to obtain the final correction data, by which the optical deflecting device is controlled.

Correcting method of light beam position in light beam scanning apparatus

There is proposed a method and apparatus for multibeam scanning an inner face of a cylindrical drum, in which scanning lines are straightened under a simple control, and an interval between the scanning lines can be easily changed, thereby simplifying a constitution. In an embodiment, while keeping an interval between two light beams projected to an optical scanning system, the light beams are one-dimensionally deflected in mutually orthogonal directions in synchronism with a rotation of the spinner, respectively. In a second embodiment, one light beam is projected along a central axis common with the spinner and the cylindrical drum to the spinner. The other light beams are inclined in a plane including the central axis by a constant angle &phgr; separately predetermined for each of the other light beams, and further inclined in a direction orthogonal to the plane including a rotation axis by an angle &phgr; which is determined in synchronism with a rotation angle &thgr; of the spinner.

Method and apparatus for inner face scanning with multi beams

There are proposed light beam scanning method and device for scanning with plural light beams split by using a multi-frequency acousto-optic device (AOM). By remarkably increasing the number of light beams, an image is recorded at a higher speed. Plural incident light beams are split in the subsidiary scanning direction by different multi-frequency acousto-optic devices. The split light beams are displaced so as not to overlap one another in the subsidiary scanning direction, while respective sets of light beams split by the acousto-optic devices are deviated in a main scanning direction, for scanning. The deviation in the main scanning direction is compensated with a clock timing of an image signal. The light beams split by the AOMs may be alternately positioned in the subsidiary scanning direction. Alternatively, a set of light beams split by one AOM may be adjacent to a set of light beams split by another AOM in the subsidiary scanning direction.

Growing community of inventors

Kanagawa, Japan

Norihisa Takada