Fujikoshi Machinery Corp.

Fujikoshi Kikai Kogyo Kabushiki Kaisha

Norihiko Moriya

Tsuyoshi Hasegawa

Yoshio Nakamura

Atsushi Kajikura

Makoto Nakajima

Yasuhide Denda

Yoshinobu Nishimoto

Takumi Kobayashi

Tadakazu Miyashita

Kazutaka Shibuya

Satoki Kanda

A polishing apparatus which includes a polishing head for holding a work, and a polishing plate on which a polishing pad is adhered. The polishing head includes a holding plate, an elastic sheet member fixed to an edge of the holding plate, a ring-shaped template fixed to an outer edge of a lower face of the elastic sheet member, a pressure chamber formed between a lower face of the holding plate and an upper face of the elastic sheet member, a seal ring having a main body part which is fitted to a supporting plate, a seal lip, which slidelingly contacts the elastic sheet member and divides the inside of the pressure chamber into an inner divided chamber and an outer divided chamber; and a fluid supply section for individually supplying a fluid to the divided chambers.

Polishing head capable of continuously varying pressure distribution between pressure regions for uniform polishing

In the method of precisely polishing a work, torque of a sun gear and an internal gear are kept constant and a load applied to a carrier is reduced and maintained. The method comprises the steps of: changing a rotational speed of at least one of the sun gear, the internal gear, an upper polishing plate and a lower polishing plate; measuring rotation torque of a driving motor of at least one of the sun gear and the internal gear; detecting the minimum rotation torque measured in the measuring step; and adjusting the rotational speed of at least one of the sun gear, the internal gear, the upper polishing plate and the lower polishing plate so as to make the rotation torque thereof equal to the minimum rotation torque or running rotation torque, the running rotation torque being greater by a prescribed value than the minimum rotation torque.

Method of polishing work

The method of the present invention cleans abrasive faces of an upper abrasive plate and a lower abrasive plate of an abrasive machine. The method is executed by a cleaning device including: a nozzle for jetting water; a brush for preventing the jetted water from scattering in the air, the brush enclosing the nozzle; and another brush for closing a gap between the preventing brush and an outer edge of the upper abrasive plate, the method is characterized by the steps of: jetting water from the nozzle toward the abrasive face of the upper abrasive plate; moving the nozzle toward the outer edge of the upper abrasive plate; and closing the gap by the closing brush when the gap is formed between the preventing brush and the outer edge of the upper abrasive plate.

Method and device for cleaning abrasive plates on an abrasive machine

The abrasive machine is capable of feeding a proper amount of slurry and preventing a work piece from sticking on an upper abrasive plate. The abrasive machine comprises: the upper abrasive plate abrading an upper face of the work piece and having a plurality of slurry holes for feeding the slurry to the work piece; a lower abrasive plate abrading a lower face of the work piece; a slurry feeding unit pressurizing and feeding the slurry; a plurality of slurry paths respectively connecting the slurry holes to the slurry feeding unit; a plurality of valve mechanisms respectively provided to the slurry paths so as to control flows of the slurry; and a control section for controlling the valve mechanisms.

Abrasive machine and method of abrading work piece

The polishing machine is capable of evenly applying a pressing force from an upper polishing plate to work pieces accommodated in through-holes of carriers. The polishing machine comprises: a plurality of the carriers provided around a center of gravity of an upper polishing plate and sandwiched between the polishing plates. Circular motion of the carriers, without revolving, are performed independently. Centers of gravity of the work pieces, which are held by the carriers, are simultaneously moved close to a center of gravity of the upper polishing plate and simultaneously moved away therefrom, and moving distances of the centers of gravity of the work pieces are equal.

Polishing machine

Method of cleaning abrasive plates of abrasive machine and cleaning device

Method for abrading a work piece with a fixed load including a first abrading process in which pressure of a cylinder chamber of a cylinder unit suspending an upper abrasive plate is adjusted in order to apply first pressure to the work piece via the upper abrasive plate without applying the full weight of the upper abrasive plate and a second abrading process in which the pressure of the cylinder chamber is readjusted in order to to apply second pressure which is higher than the first pressure to the work piece via the upper abrasive plate without applying the full weight of the upper abrasive plate.

Method of abrading both faces of work piece

The abrasive machine of the present invention is capable of smoothly adjust the pressing force of an upper plate. The abrasive machine includes a plate supporting mechanism, which supports the upper polishing plate and is capable of adjusting a pressing force. The plate supporting mechanism comprises: a base frame; a cylinder unit being provided to an upper part of the base frame, ; a rotary plate being rotatably attached to a lower end of a piston rod of the cylinder unit; a plurality of connecting rods being pierced through the rotary plate, lower ends of the connecting rods being connected to the upper plate so as to rotate the upper plate together with the rotary plate; and a plurality of elastic members being provided between the stopper sections of the connecting rods and the rotary plate, whereby the pressing force of the upper plate is adjusted by adjusting a lifting force of the cylinder unit, which suspends the upper plate.

Growing community of inventors

Nagano, Japan

Norihiko Moriya