Tokyo Electron Limited

Norifumi Sato

Masatoshi Deguchi

Akihiro Teramoto

Toshichika Takei

Ikuo Sunaka

Daisuke Ishimaru

Hideo Funakoshi

Yukio Kiba

Tetsushi Miyamoto

Shigenori Kamei

Kazuhisa Hasebe

Wataru Kiyota

Shinichi Machidori

A substrate treatment system includes a plurality of treatment apparatuses, a position adjustment apparatus adjusting a center position of the substrate, a substrate transfer apparatus transferring the substrate to the treatment apparatuses and the position adjustment apparatus, and a control unit controlling operations of the apparatuses. The substrate transfer apparatus includes an arm part curved along a peripheral edge portion of the substrate with a radius of curvature larger than a radius of the substrate, and a holding part projecting inward from the arm part and holding a rear surface of the substrate. The position adjustment apparatus includes a mounting table which holds a central portion of the rear surface of the substrate and is rotatable and horizontally movable. The control unit controls the mounting table such that the center position of the substrate held on the mounting table is aligned with a center position of the arm part.

Substrate treatment system, substrate treatment method, and non-transitory computer storage medium

The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.

Developing treatment method, program, computer storage medium and developing treatment system

Substrate holder

Substrate transfer holder

Growing community of inventors

Koshi, Japan

Norifumi Sato