Nippon Soda Co., Ltd.

Norifumi Nakamoto

Yoshitaka Fujita

Tomoya Hidaka

Nobuo Kimura

Kazuhisa Kumazawa

Eiji Hoshi

Motoyuki Toki

Akiji Higuchi

Kazuo Ono

Hiroyuki Takeda

A solution for forming an organic thin film wherein the total starting amount of metal surfactants (A) and (B) is 0.05 to 50 wt %, the amount of a hydroxyl group-containing compound generated with the progress of the hydrolysis reaction is 20 ppm to 6 wt %, and the amount of a compound (C) that can interact with the metal surfactant is 0.01 ppm to 8 ppm in terms of metal, relative to the total amount of the solution for forming an organic thin film.

Method for forming organic thin film

A method is provided for forming an organic thin film comprising:

A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.

Method for producing organic thin film

A forming mold or electroforming mother die including a mold or mother die, and a release layer composed of an organic thin film on a mold surface or mother die surface which is formed by contacting the mold or mother die with an organic solvent solution including a silane surfactant represented by formula [1]R&#x2014;Si&#x2014;X&#x2003;&#x2003;[1]where R represents an optionally substituted hydrocarbon group or halogenated hydrocarbon having 1 to 20 carbon atoms, or a hydrocarbon group or a halogenated hydrocarbon group having a linking group which has 1 to 20 carbon atoms, X represents a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, or an acyloxy group, and n represents an integer of 1 to 3; and a catalyst capable of interacting with the silane surfactant, and a production method thereof.

Forming mold or electroforming mother die having release layer and method for manufacturing the same

A method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.

The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200&#xb0; C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provides metal oxide thin-films and organic-inorganic hybrid materials endowed with various capabilities, particularly organic-inorganic hybrid materials having a high refractive index and high transparency. Use is made of a dispersoid having metal-oxygen bonds which is obtained by mixing a metal compound having at least three hydrolyzable groups with at least 0.5 mole but less than 2 moles of water per mole of the metal compound in an organic solvent, in the absence of an acid, a base and/or a dispersion stabilizer, and at a temperature at or below the temperature at which the metal compound begins to hydrolyze, then raising the temperature to at least the temperature at which hydrolysis begins.

Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film

An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.

To provide a method which allows the combination of rapid formation of a chemical adsorption film with the preparation of the film which is reduced in the content of impurities and having a dense structure. A method for preparing a chemical adsorption film on the surface of a substrate containing an active hydrogen, characterized in that it includes treating a metal based surfactant having at least one hydrolyzable group with a metal oxide or a partially hydrolyzed product from a metal alkoxide and water in an organic solvent to form a solution, and contacting the solution with the surface of the substrate.

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Ichikawa, Japan

Norifumi Nakamoto