Hitachi High-tech Science Corporation

Nec Corporation

Sii Nanotechnology Inc.

Hitachi High-tech Corporation

Noriaki Sakai

Yoshiki Matoba

Hideyuki Akiyama

Ryusuke Hirose

Masafumi Watanabe

Yoshihiro Hirano

Toshitada Takeuchi

Toshiyuki Takahara

Kenji Namiki

Hiroyuki Arii

Hiroaki Nohara

Disclosed is an apparatus and method for analyzing an evolved gas, wherein the precision of detection of a gas component is improved without enlarging the apparatus. The apparatus includes a gas component evolving unit, a detection member for detecting the gas component, and a mixed gas channel for allowing a mixed gas containing the gas component and carrier gas to flow therethrough, and further includes a branch channel branched from the mixed gas channel, an inert gas channel for allowing an inert gas to flow therethrough, a first flow rate regulator for adjusting the flow rate of the carrier gas, a second flow rate regulator for adjusting the flow rate of the inert gas, and a flow rate control unit for controlling the second flow rate regulator such that the flow rate of the mixed gas guided to the detection member is a predetermined value.

Apparatus and method for analyzing evolved gas

The apparatus for mass analysis includes: a heating unit heating a sample containing a first substance and a second substance having different gasification temperatures to evolve gas components; a heating control unit controlling the heating unit to heat the sample at a first temperature point at which gas of the first substance is evolved and gas of the second substance is not evolved, until reaching a first time point, whereafter the heating unit is controlled to heat the sample until reaching a second temperature point at which gas of the second substance is evolved; and an analysis control unit performing mass analysis under a first measurement condition assigned to the first substance until reaching the first time point at the first temperature point, and performing mass analysis under a second measurement condition assigned to the second substance at the second temperature point.

Apparatus for and method of mass analysis

The present invention relates to a plastic reference material and a method of manufacturing the same, wherein the concentration of at least one chemical substance is characterized from a signal intensity of the chemical substance and a signal intensity of the isotope-labeled chemical substance of the chemical substance obtained using the pyrolysis GC-MS instrument by weighing a mass of a candidate material for the plastic reference material using a balance, weighing an isotope-labeled chemical substance of the chemical substance using a balance, preparing a mixed solution by dissolving the weighed candidate material for the plastic reference material and the weighed isotope-labeled chemical substance in a solvent, introducing a product resulting from evaporation of the solvent from the mixed solution into a pyrolysis GC-MS instrument, and calculating the concentration of the chemical substance included in the candidate material for the plastic reference material.

Plastic reference material and method of manufacturing the same

An X-ray fluorescence spectrometer includes: a sample stage configured to place a sample thereon; an X-ray source configured to irradiate the sample with primary X-rays; a detector, which is configured to detect fluorescent X-rays produced from the sample irradiated with the primary X-rays, and which includes an X-ray incident window formed by a window material through which fluorescent X-rays is transmittable; and a gas blowing mechanism configured to blow a gas to at least one of an outer surface of the X-ray incident window and the sample stage.

X-ray fluorescence spectrometer comprising a gas blowing mechanism

Provided is an X-ray analyzer that is capable of reducing measurement time necessary for mapping analysis by measuring only regions on a sample targeted by a measurer with minimal action. A superimposition process of a mapping image and image data of the sample is performed, and a position corresponding to an irradiation point is determined. Based on the result, the image is displayed, and measurement execution regions are designated on the displayed image and hence a sample moving mechanism moves at high speed in regions excluding the designated regions.

X-ray analyzer

An X-ray tube which irradiates a primary X-ray to an irradiation point on a sample, an X-ray detector which detects a characteristic X-ray and a scattered X-ray emitted from the sample and outputs a signal including energy information on the characteristic X-ray and scattered X-ray, an analyzer which analyzes the signal, a sample stage on which the sample is placed, a moving mechanism which moves the sample on the sample stage, the X-ray tube, and the X-ray detector relative to each other, a height measuring mechanism which measures a maximum height of the sample, and a control unit which adjusts the distance between the sample and the X-ray tube and the distance between the sample and the X-ray detector by controlling the moving mechanism on the basis of the measured maximum height of the sample, are included.

X-ray analyzer and X-ray analysis method

A post-normalizing unit for use in a floating-point arithmetic circuit having a pre-normalizing unit for carrying out a pre-normalization operation on first and second exponent parts and first and second fraction parts to produce a maximum exponent part and first and second pre-normalized fraction parts, an arithmetic unit for carrying out an arithmetic operation on the first and the second pre-normalized fraction parts to produce an operated fraction part, and first and second shift count calculating circuits calculate first and second shift counts for use in normalizing the operated fraction part with an input cardinal number regarded as first and second cardinal numbers, respectively. Supplied with the operated fraction part, first and second shifters left-shift the operated fraction part on the basis of the first and the second shift counts to produce first and second shifted fraction parts, respectively. Supplied with the maximum exponent part, first and second exponent adjusting circuits adjust the maximum exponent part by using the first and the second shift counts to produce first and second adjusted exponent parts, respectively. A result selector selects one of the first and the second shifted fraction parts as a post-normalized fraction part. An exponent adjustment selector selects one of the first and the second adjusted exponent part as a post-normalized exponent part.

Normalizing circuit of floating-point arithmetic circuit for two input

A vector mask control unit and method of operating same prevents the unnecessary reading or arithmetic operation of operands corresponding to mask inhibitory bits by generating a total address increment value based on the number of consecutive operation-inhibitory bits counted by a counter, the total address increment value being composed of at least one increment value that is multiplied by a power of two. The total address increment value is added to a vector address to obtain an operand address. As a result, the efficient procession of masked vector instructions can be easily achieved.

Growing community of inventors

Tokyo, Japan

Noriaki Sakai