Hitachi Maxell, Limited

Maxell Holdings, Ltd.

Noriaki Otani

Teruhisa Miyata

Yoshimasa Mitsumoto

Sadamu Kuse

Mikio Kishimoto

Yuji Yamashita

Yuko Sawaki

Tetsuya Taki

Nobuko Kasajima

Tomoki Inakura

A transparent heat shielding and insulating member of the present invention includes a transparent base and a functional layer formed on the transparent base. The functional layer includes an infrared reflecting layer, a primer layer and a protective layer laminated in this order from the transparent base side. The primer layer is formed of a modified polyolefin resin having an acid group or a hydroxyl group, and the protective layer is formed of an ionizing radiation curable resin or a thermosetting resin.

Transparent heat shielding and insulating member, and method for producing the same

A transparent heat-shielding/heat-insulating member includes a transparent substrateand, from the transparent substrate side, an infrared reflective layerand a protective layerin this order. The protective layerincludes, from the infrared reflective layer side, a medium refractive index layer, a high refractive index layerand a low refractive index layerin this order. The medium refractive index layerhas a light refractive index at a wavelength of 550 nm of 1.45 to 1.55 and a thickness of 80 to 200 nm. The high refractive index layerhas a light refractive index at a wavelength of 550 nm of 1.65 to 1.95 and a thickness of 100 to 350 nm. The low refractive index layerhas a light refractive index at a wavelength of 550 nm of 1.30 to 1.45 and a thickness of 70 to 150 nm.

Transparent heat-shielding/heat-insulating member and production method thereof

An optical film according to the present invention comprises a transparent base, and an anti-reflection layer that is disposed on one main face of the transparent base. The anti-reflection layer includes a hard coating layer, and a low refractive index layer that is disposed on the hard coating layer in this order from the side of the transparent base. The hard coating layer is formed using a resin containing an ionizing radiation setting resin. The hard coating layer contains a conductive metal oxide in an amount of at least 5 wt % and at most 30 wt % with respect to the total weight of the hard coating layer. The hard coating layer is formed using a coating solution containing water in an amount of at least 0.05 wt % and at most 5.0 wt %.

Optical film and method for producing the same

A near-infrared shield according to the present invention includes a base and a near-infrared absorption layer disposed on one main surface of the base. When the near-infrared shield is irradiated from the near-infrared absorption layer side with xenon light having a wavelength of 380 nm to 1200 nm at an illuminance of 60 W/m(an energy density in a range of 300 nm to 400 nm) for 16 hours under a condition of BPT of 63&#xb0; C. and a relative humidity of 50%, chromaticity changes &#x394;x, &#x394;y of transmitted light, which are shown in a chromaticity diagram of a CIE1931XYZ color system, are 0.005 or less respectively. The near-infrared shield has an excellent near-infrared shielding property and an excellent light resistance, and its near-infrared absorptivity does not deteriorate even after long-term storage.

Near-infrared shield and display front plate

An aqueous solution of a tin salt and an indium salt is added to an aqueous alkaline solution to form a hydroxide or a hydrate comprising tin and indium, the hydroxide or hydrate is heated at a temperature of 110 to 300&#xb0; C. in the presence of water, filtered and dried, and then the hydroxide or hydrate is heated at a temperature of 200 to 1000&#xb0; C. to form the tin-containing indium oxide particles. Thereby, tin-containing indium oxide particles which have a plate-form shape and an average particle size in the plane direction of 10 to 200 nm are obtained. The tin-containing indium oxide particles are suitable for forming an electrically conductive transparent coating film.

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Osaka, Japan

Noriaki Otani