W.c. Heraeus Gmbh

Heraeus Precious Metals Gmbh & Co. Kg

Leybold Materials Gmbh

Norbert Wollenberg

Jens Troetzschel

Goran Pavlovic

Martin Schlott

Harald Manhardt

Nicole Staudt

Josef Heindel

Nicole Guebler

Helmut Luh

One aspect relates to an electrical bushing for an implantable device including an electrically insulating base body and at least one electrically conductive bushing body that is embedded in at least one bushing opening that extends through the base body. The base body is produced from a sintered ceramic material, characterized in that the at least one bushing body is made of a sintered cermet material or a sintered metallic material. The base body and the at least one bushing body comprise a firmly bonded sintered connection.

Sintered electrical bushings

One aspect relates to a method for producing an electrical bushing for an implantable device, a corresponding electrical bushing, and a corresponding implantable device. The method according to one embodiment is characterized in that a green blank is produced and sintered from an electrically insulating base body green blank made of a ceramic slurry or powder and at least one electrically conductive bushing body green blank made of a cermet material. The at least one bushing body green blank is inserted into a bushing opening of the base body green blank to form a composite green blank, a shape of the at least one bushing body green blank and a shape of the at least one bushing opening are complementary to each other at least in sections thereof and prevent slippage of the bushing body green blank through the bushing opening. The composite green blank is sintered while applying a force that keeps the bodies together.

Method for sintering electrical bushings

A frame (3, 4, 5, . . . 7) at least partially surrounds the target material (19), and serves to mount the target on the cathode backing plate (9), with a separating film or interlayer (20) of soft material disposed between the frame and the cathode backing plate. The frame (3, 4, 5, . . . 7) is provided with a plurality of projections (3a, 3b, . . . 4a, 4b, . . . 7a, 7b . . . ) affixed to the frame members (3, 4, 5, . . . 7) and extending into the target material in order to hold the target material (19) in the spaces (A, B, C) surrounded by the frame members. The target is preferably cast directly into the frame while the frame is fixed to a stainless steel plate, then removed together with the frame after cooling and mounted to the cathode plate.

Target for the sputtering cathode of a vacuum coating apparatus and

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Grosskrotzenburg, Germany

Norbert Wollenberg