Ciba-geigy Corporation

Ciba-geigy Ag

Ocg Microelectronics, Inc.

Ciba Specialty Chemicals Corporation

Qcg Microelectronics

Norbert Munzel

Reinhard Schulz

Martin Roth

Stephan Ilg

Ulrich Schadeli

Heinz Holzwarth

Wilhelm Knobloch

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituent;

High resolution i-line photoresist of high sensitivity

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituents;

Positive photoresist compositions comprising, in an organic solvent, at least

Positive photoresists with enhanced resolution and reduced

Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,

Positive photoresist having improved processing properties

Positive photoresists containing quinone diazide photosensitizer,

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Heitersheim, Germany

Norbert Munzel