Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Friedrich-schiller-universitaet Jena

Friedrich-schiller-universitat Jena

Rodenstock Gmbh

Fresnel Optics Gmbh

Norbert Kaiser

Ulrike Schulz

Peter Munzert

Friedrich Rickelt

Torsten Feigl

Sergiy Yulin

Stefan Schwinde

Mark Schürmann

Heiko Knopf

Kevin Füchsel

Harald Schenk

Thilo Sandner

Nicolas Benoit

Jörg Heber

Uwe Jan Schmidt

Uwe Schallenberg

Philipp Naujok

Sergey Yulin

Thomas Kuhlmann

Minghong Yang

Alexandre Gatto

Hanno Heiße

Irmina Wendling

Michael Scheler

Antje Kaless

Martin Bitzer

Robert Müller

Hanno Heiβe

Kevin Murray

Viatcheslav Nesterenko

Cécile Stolz

Bärbel Götz

Werner Hofmann

A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.

Multilayer mirror for reflecting EUV radiation and method for producing the same

An optical element is disclosed. In an embodiment an optical element includes a substrate having a silicone surface, an antireflection layer overlying the silicone surface, wherein the antireflection layer comprises a first organic layer having a reflection-reducing nanostructure, the nanostructure having a depth of at least 30 nm, and a cover layer overlying the first organic layer, the cover layer having a thickness of no more than 40 nm.

Optical element

A method for producing a reflector element and a reflector element are disclosed. In an embodiment the method includes depositing a layer sequence on a substrate, wherein the layer sequence includes at least one mirror layer and at least one reactive multilayer system and igniting the reactive multilayer system in order to activate heat input in the layer sequence.

Method for producing a reflector element and reflector element

A reflection-reducing layer system is disclosed. In an embodiment, the system includes a refractive index gradient layer including an inorganic material and an organic material in a spatially varying composition, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction and an organic layer arranged above the refractive index gradient layer, the organic layer having a surface including a nanostructure.

Method for producing a reflection-reducing layer system and reflection-reducing layer system

An optical element including a reflective coating is disclosed. In an embodiment the reflective coating includes an adhesion-promoting layer, an at least partially reflective silver layer disposed on the adhesion-promoting layer and a protective layer system disposed on the silver layer, wherein the protective layer system includes a plurality of dielectric layers, wherein the dielectric layers include at least one first layer and at least one second layer, wherein the first layer and the second layer have a different resistance to at least two different contamination substances, wherein the dielectric layers have a thickness of not more than 30 nm, and wherein a number of the dielectric layers amounts to at least five.

Optical element comprising a reflective coating

A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.

Method for producing an antireflection layer on a silicone surface and optical element

A method for producing a reflection-reducing layer system on a substrate and a reflection-reducing layer system are disclosed. According to an embodiment the method includes depositing a refractive index gradient layer on the substrate by co-evaporation of an inorganic material and an organic material, wherein the refractive index gradient layer has a refractive index which decreases in a growth direction, depositing an organic layer above the refractive index gradient layer, and producing a nanostructure in the organic layer by a plasma etching process.

A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process.

Method for producing an antireflection coating

A reflection-reducing interference layer system is disclosed, which has at least three alternating layers having different refractive indices. At least one nanostructured layer comprising an organic material or an organic-inorganic hybrid material is applied to the alternating layers. With the interference layer system, it is possible to obtain very low reflection over a wide wavelength and incident angle range.

Reflection-reducing interference layer system and method for producing it

In a process for the fabrication of a radiation-absorbing optical element that contains a substrate () of plastic, a layer with a graduated refractive index () is fabricated on at least one surface () of the substrate () using a plasma etching process, after which a metal layer () is applied on top of the layer with a graduated refractive index ().

Method for producing a radiation-absorbing optical element and corresponding radiation absorbing optical element

In a multilayer mirror () for the reflection of EUV radiation containing a large number of alternating molybdenum layers () and silicon layers (), a barrier layer () containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers () and the silicon layers (). As a result of the barrier layers () of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300&#xb0; C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror () of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.

Thermally stable multilayer mirror for the EUV spectral region

An optical element is provided with a fog reducing polymer layer. A reflection reducing nanostructure is formed on the surface of the fog reducing polymer layer.

Optical element with an anti-fog layer and method for its production

The invention relates to micromechanical mirrors with a high-reflection coating for the deep-ultraviolet (DUV) and vacuum-ultraviolet (VUV) spectral range, based on a substrate which is coated with an aluminum layer and a transparent blooming coating. Likewise the invention relates to a method for the production of such micromechanical layers with a high-reflection coating and to the use thereof for the production of microsensors, optical data stores or video and data projection displays.

Micromechanical mirrors with a high-reflection coating, method for production thereof and use thereof

The invention relates to a monochromator mirror for the EUV-spectral range, provided with a layer arrangement placed on a substrate, comprising a periodic sequence of two individual layers (A, B) made of different material forming a period having a thickness d in the form of a spacer-layer or an absorber-layer, whereby the reflectivity of the second or a higher Bragg-order is used. Said thickness d has a dimensional deviation of a maximum of 3% and the ratio of the layer thickness of the absorber-layer to the period thickness is smaller than the ratio of 0.8 of the used order of the Bragg-Reflexion.

Monochromator mirror for the EUV-spectral range

The invention relates to a reflection reducing coating on a substrate which is formed from an alternating change layer system each having a lower and higher refractive index. In particular, the invention can be advantageously employed on surfaces of substrates such as optical elements and spectacle glasses, in particular. According to the object most different substrates are to be coated, and during the deposition of a reflection reducing coating an unacceptable temperature rise of the respective substrate is not to occur. With this, a coating is deposited in which the sum of the layer thicknesses of layers each having a higher refractive index is &lE;5% of the total layer thickness of the coating, and the layers of the material having a higher refractive index within the layer sequence of the change layer system are uniformly distributed.

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Jena, Germany

Norbert Kaiser