Asml Holding N.v.

Asml Netherlands B.v.

Nora-Jean Harned

Robert D Harned

Cheng-Qun Gui

Pieter Willem Herman De Jager

Azat M Latypov

Stanislav Y Smirnov

Yevgeniy Konstantinovich Shmarev

Eric Brian Catey

Richard A Gontin

Robert Tharaldsen

Richard Jacobs

Disclosed are systems and methods for time differential reticle inspection. Contamination is detected by, for example, determining a difference between a first signature of at least a portion of a reticle and a second signature, produced subsequent to the first signature, of the portion of the reticle.

Time differential reticle inspection

An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.

Method for improved optical design using deterministically defined surfaces

The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes an interferometer, an optical element, and an SLM. The interferometer provides electromagnetic radiation. The optical element conditions the electromagnetic radiation to provide a first beam of radiation and a second beam of radiation. The SLM shapes a wavefront of the first beam of radiation resulting in a shaped wavefront corresponding to an optical surface. The shaped wavefront is incident on and conditioned by the optical surface. The shape of the optical surface is analyzed based on a fringe pattern resulting from interference between the shaped wavefront mapped by the optical surface and the second beam of radiation. The system may also include an optical design module that converts a null corrector design corresponding to the optical surface into instructions for the SLM.

Diffractive null corrector employing a spatial light modulator

A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.

Projection system for a lithographic apparatus

A system for aligning of optical components includes an interferometer and a first diffractive alignment element. A housing is used for positioning a first optical element being aligned. A detector is used for detecting fringes produced by reflections off surfaces of the first optical element. A grating pattern on the first diffractive alignment element is designed to produce a retro-reflected wavefront or a wavefront transmitted or reflected in a predetermined direction when the first optical element is in alignment. The first diffractive alignment element includes a first region for alignment of the interferometer, a second region for alignment of one surface of the first optical element, and a third region for alignment of another surface of the first optical element. The first, second and third regions can be of any shape such as circular, rectangular, triangular, or the like.

Optical system alignment system and method with high accuracy and simple operation

A system and method use a pattern generator to pattern illumination that is projected using an adjustable projection system to form one or more devices on a substrate. The adjustable projection system includes at least one active mirror, which is adjusted to compensate for errors found on a surface of the pattern generator, the substrate, and or an optical element in the lithography system. In one example, the adjustable projection system includes two concave and one convex mirrors, while in another system the adjustable projection system also includes one or two fold mirrors. At least one of the mirrors in these two examples is an active mirror, which is used for the compensating. In this arrangement, local focus and/or magnification errors can be substantially reduced or eliminated.

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Redding, CT, United States of America

Nora-Jean Harned