Mitsubishi Denki Kabushiki Kaisha

Mitsubishi Electric Corporation

Nobuyuki Zumoto

Takahisa Nagayama

Toshinori Yagi

Masaaki Tanaka

Masao Izumo

Teruo Miyamoto

Susumu Hoshinouchi

Hirofumi Tanaka

Yasuhito Myoi

Hiroshi Teramoto

Shigeru Nishimoto

Yoshihiro Ishi

Atsushi Ito

Kazuo Yamamoto

Akimasa Yuuki

Tomohiro Sasagawa

Hisashi Harada

Hajime Nakatani

Takao Tsurimoto

Takayuki Hirano

Atsushi Sugitatsu

Toshiyuki Yoneda

Kazushi Hanakawa

Masahiko Sakamoto

Yuichiro Murata

Youichi Hisamori

Hiromitsu Inoue

Tadao Minagawa

Hiroshi Isoya

Yasushi Minamitani

Yoshifumi Matsushita

Toru Takahama

Noriko Morita

Yuko Kijima

Yoshie Uchiyama

To provide a structure capable of securing satisfactory induction coupling efficiency and high reliability in manufacturing an induction coupling apparatus used in power line carrier communication, the induction coupling apparatus having a magnetic core formed from a first core element part and a second core element part so that a gap would be formed between the core element parts, includes: a core parallel moving mechanism for carrying out relative and parallel movement of the first core element part and the second core element part in a direction that the length of the gap varies; and a predetermined gap length regulating member for limiting parallel movement in a direction that the first core element part and the second core element part approach each other to regulate the gap length to the predetermined gap length in the case that the core parallel moving mechanism is used for the parallel movement.

Induction coupling apparatus

An RF accelerating cavity includes an accelerating cavity unit and an inductance varying device having a magnetic member connected parallel to an acceleration electrode gap. The RF accelerating cavity is tuned in such a fashion that a charged particle beam acceleration frequency matches a resonant frequency of the RF accelerating cavity by regulating inductance of the inductance varying device in accordance with a changing pattern of the charged particle beam acceleration frequency. Alternatively, impedance of the RF accelerating cavity is increased with the provision of a fixed inductance connected parallel to the acceleration electrode gap when the RF accelerating cavity has a narrow acceleration frequency range.

Radio-frequency accelerating cavity and circular accelerator

An objective is to provide a circular acceleration apparatus that can accelerate higher currents as well as avoid complex controlling of a deflecting magnetic field generated by an electron deflection unit. The circular acceleration apparatus is provided, which comprising a circular acceleratorincluding an electron acceleration unitand a deflection-magnetic-field generating unit; an electron generator, to which a pulsed voltage is applied, to generate electrons for injecting to the circular accelerator; and a circuit element which generates the pulsed voltage for providing to the electron generatorby making the pulsed voltage applied to the electron generatorhave at least one of a slow rising edge and a slow falling edge.

Circular acceleration apparatus, electromagnetic wave generator and electromagnetic-wave imaging system

An electromagnetic wave generating device includes: a hollow annular vacuum chamber; an electron gun; an electromagnet configured with a pair of discoid combinations in which a cylindrical accelerating magnet pole and an annular focusing magnet pole are arranged in this order from the inner side to the outer side of the combinations, and are disposed symmetrically and concentrically with each other on both sides of the chamber and coaxially with the center axis of the chamber, and a return yoke disposed outside both accelerating and focusing magnet poles and the chamber; accelerating coils wound around the accelerating magnet poles, for exciting the poles; and focusing coils wound around the focusing magnet poles, for exciting the poles; wherein a through hole is formed at the center of the accelerating magnet pole so that power supply wires connecting the accelerating coils to an accelerating power supply are led out through the hole.

Electromagnetic wave generating device

The electrode lengths of a plurality of electrodes linearly arranged in an acceleration cavity are proportional to the velocity of a traveling ion beam. Further, the electrode length is so designated that, in each half of a predetermined cycle in the ion beam direction of travel, the absolute value of a difference, relative to a length that is proportional to the beam traveling velocity is equal to or greater than a value corresponding to the phase width of the traveling ion beam, is provided for electrodes that do not exceed three units and that are fewer than electrodes allotted to half the predetermined cycle.

Linear ion accelerator

A display device includes a light guide plate which includes a light transmission portion and an antireflection portion at two opposite end faces and which is provided with a light extraction portion in part of a surface, respective light sources which are arranged on outer sides of the two opposite end faces, a transmission liquid crystal panel located adjacent to the light extraction portion, and a synchronous drive unit that alternately turns ON the light sources and that displays an image that is synchronous with an alternating turn-ON operation of the transmission liquid crystal panel.

Display device with light guide plate having antireflection portions on light incident surfaces

A high performance beam accelerator in which accelerating voltage may be increased by applying a high excitation frequency to the accelerator core and controlling heat generation. The beam accelerator includes an annular hollow vessel with an annular passage, fixed magnetic field generators generating magnetic fields for deflecting and guiding a charged particle beam into an orbit, an accelerating gap for inducing an accelerating electric field, and an accelerator core for generating the accelerating electric field via the accelerating gap by changing magnetic state in accordance with electromagnetic induction. Injection to ejection of charged particles is completed within one cycle of the excitation frequency applied to the accelerator core. The accelerator core includes wound multiple layers of a ribbon-shaped soft magnetic alloy, 50 &mgr;m or less in thickness, and having a saturation magnetic flux density of 1 Tesla or more.

Beam accelerator

A light device includes a shielding plate ( ) having an opening ( H) of a rectangular cross-sectional configuration and placed over an optical window retainer ( ). The shielding plate ( ) is placed so that an opening wall surface ( HS) thereof is positioned on an optical path (Zr(x)) of light emerging from an optical window ( ) at a usable angle (&thgr;e) and that a half width (Xu) of the opening ( H) satisfies Xu&equals;u/cot(&thgr;e)&plus;t&times;sin(&thgr;e)/sgrt(n &minus;sin (&thgr;e))&plus;s. The optical window retainer ( ) is placed in a region outside a boundary line given as Zh(x)&equals;&plusmn;(1&times;tan(&thgr;e)(x&plusmn;Xu)&plus;u (plus (&plus;) when x&lE;&minus;Xu; minus (&minus;) when x&gE;Xu) and also in aregion outside the optical path (Zr(x)). The light source device suppresses an uneven illuminance distribution of exposure light resulting from superimposition of light scattered from the opening wall surface of the optical window retainer upon the exposure light.

Light source device, exposure apparatus and cathode ray tube panel

An apparatus for patterning a phosphor screen on the faceplate of a cathode-ray tube has a main lens that refracts light to simulate electron-beam trajectories. The main lens includes a fixed lens with a curved surface, and at least one replaceable flat element. The apparatus also has at least one sub-lens, with a curved surface, that can be substituted for the flat element to compensate for inaccurate simulation of the electron-beam trajectories. The flat element and the sub-lens have the same thickness, so that substitution of the one for the other does not produce an unintended shifting of light paths. Preferred sub-lenses include lenses having surfaces described by a bilaterally symmetric cosine function, and by a product of a sine function and a linear function.

Apparatus for patterning a phosphor screen, having a main lens with flat elements replaceable by sub-lenses

An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

Optical processing method and apparatus for carrying out the same

An optical transmission system permitting any desired machining to be done by radiating to an object to be irradiated a laser beam having an optimum intensity distribution in the direction of its optical axis or in a plane perpendicular to the optical axis, comprising a laser oscillator 1, an optical fiber 3 for propagating the laser beam emitted from the laser oscillator 1 by a predetermined distance, a condenser lens 2 for converging the laser beam from the laser oscillator 1 into the optical fiber 3, a first lens 6 for forming images with aberration from the laser beam emerging from the optical fiber 3, a mask 7 disposed in a position having a predetermined light intensity distribution out of the positions of the images formed by the first lens 6, and a second lens 4 for forming the image passing through the mask 7 onto an object 5 to be irradiated.

Optical transmission system and light radiating method

An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.

Optical processing apparatus

A laser machining apparatus comprises a mask, a reflecting mirror and an imaging optical system. The laser light reflected by the mask and also by the reflecting mirror passes through the mask and images on the work for machining the work. The laser machining apparatus comprises means for causing said mask to move in parallel with said work for machining the work. This laser machining apparatus is able to machine a work having a large surface using small apertured mask. Another type of laser machining apparatus comprises a mask and a platform and an imaging optical system. The mask and the work are puts in the same plane of the platform and driven so that the image of the mask is mapped on the work via the imaging optical system. The laser machining apparatus is able to machine a large area at low price and high accuracy.

Laser machining apparatus

An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. The reflective parts are on a first surface of the mask. The mask also includes a reflection member for returning the light reflected at the reflective parts of the mask toward the mask.

Optical machining apparatus

A thin film forming apparatus of the present invention comprises: a reaction chamber for receiving therein a substrate and a thin film forming gas; an ultraviolet laser beam oscillator for generating an ultraviolet laser beam for causing dissociation of the thin film forming gas to thereby form a thin film over the surface of the substrate; and a plasma generator for generating ions for controlling growth of a thin film.

Growing community of inventors

Tokyo, Japan

Nobuyuki Zumoto