Sony Corporation

Kabushiki Kaisha Toshiba

Ricoh Company, Ltd.

Jfe Steel Corporation

Toyo Seikan Kaisha, Ltd.

Idemitsu Kosan Company, Limited

Nec Corporation

Fuji Xerox Co., Ltd.

Jfe Mineral Company, Ltd.

Kawatetsu Mining Co., Ltd.

Canon Kabushiki Kaisha

Sony Group Corporation

Oki Data Corporation

Idemitsu Petrochemical Co., Ltd.

Nec Access Technica, Ltd.

Nobuyuki Sato

Ken Nakajima

Yutaka Yoneda

Ryota Kosakai

Masatoshi Sase

Hiroki Nagahama

Katsutoshi Aiki

Akihiko Okada

Katsuhiro Imazu

Hiroshi Matsubayashi

Kenji Matsuno

Seiji Kobayashi

Hiroaki Ono

Hideyuki Takahashi

Tomoo Mitsunaga

Kazuhisa Ishibashi

Yoshihiro Yamaguchi

Yusuke Kawaguchi

Seishichi Kobayashi

Takeshi Shibuya

Koichi Endo

Miyuki Okada

Kazuya Nakayama

Ikuo Komatsu

Shigeaki Hayase

Tomomi Kobayashi

Chikako Sano

Tadasu Kirihara

Kazuki Nakazato

Osamu Ebato

Kentaro Ichinoseki

Bungo Tanaka

Miwako Akiyama

Naoyuki Urata

Isao Kawanishi

Takeru Matsuoka

Kan Saito

Takahiro Sugano

Takamasa Fujii

Wataru Takahashi

Hajime Yamamoto

Masanori Takenouchi

Seiichiro Karita

Shinji Watanabe

Hajime Oyama

Shinji Kobayashi

Hiroshi Sugitani

Nobuo Kasahara

Tsuyoshi Yoshida

Masashi Miyagawa

Hiroshi Ueno

Kazuhiro Sato

Minoru Nozawa

Shuichi Yamazaki

Katsuhiko Suzuki

Satoshi Mitsui

Takeshi Yamakawa

Jun Minakuti

Hideo Kurashima

Masashi Kitani

Akira Kobayashi

Susumu Ito

Tsuneo Imatani

Takao Yamazaki

Takahiro Koyama

Kunihiko Maeoka

Yuki Ono

Tatsuya Sato

Akira Tsujimoto

Kazumi Hirota

Tomoo Murakami

Tadahiko Katsura

Yoshio Kaneko

Takashi Mama

Katsuaki Hirota

Mitsuaki Kita

Akitoshi Masuyama

Yukio Noguchi

Hiromasa Kanno

Teruyoshi Yamamoto

Akio Fukuyama

Koji Oshikiri

Satoshi Yoneda

Kumiko Masuda

Kei Otagiri

Kouji Araki

Masashi Wakatsuki

Daisuke Kuruma

Hiroyuki Kiba

Bokryong Lee

Hisao Iwamoto

Tadanobu Nagami

Tamio Fujiwara

Shinya Ishibashi

Osamu Takenouchi

Haruki Arai

Naoto Watanabe

Kazuma Kuse

Shizuaki Masuda

In a high speed image capturing state, a camera signal processing circuit is not needed to perform a signal process at a high screen rate, but at a regular screen rate. In the high speed image capturing mode, raw data of 240 fps received from an image sensorare recorded on a recording devicethrough a conversion processing sectionand a recording device controlling circuit. Raw data that have been decimated and size-converted are supplied to a camera signal processing circuitthrough a pre-processing circuitand an image being captured is displayed on a display sectionwith a signal for which a camera process has been performed. In a reproducing state, raw data are read from the recording deviceat a low screen rate according to a display performance of the display sectionand the raw data that have been read are processed are processed by the pre-processing circuitand the camera signal processing circuitand a reproduced image is displayed by the display section

Image capturing apparatus and image capturing method

In a high speed image capturing state, a camera signal processing circuit is not needed to perform a signal process at a high screen rate, but at a regular screen rate. In the high speed image capturing mode, raw data of 240 fps received from an image sensorare recorded on a recording devicethrough a conversion processing, sectionand a recording device controlling circuit. Raw data that have been decimated and size-convert d are supplied to a camera signal processing circuitthrough a pre-processing circuitand an image being captured is displayed on a display sectionwith a signal for which a camera process has been performed. In a reproducing state, raw data are read from the recording deviceat a low screen rate according to a display performance of the display sectionand the raw data that have been read are processed are processed by the pre-processing circuitand the camera signal processing circuitand a reproduced image is displayed by the display section

A sound emitting device includes: a speaker that is provided at a back surface of a user interface device; a support body that supports the user interface device; a horn portion that is provided in the support body; and a space portion that is a space formed inside the support body and extending from a sound emission region of the speaker to the horn portion.

Sound emitting device, image forming apparatus and electronic apparatus

A continuous annealing system and a continuous annealing method with which it is possible to achieve an annealing atmosphere having a low dew point which is suitable for annealing a steel strip containing easily oxidizable metals such as Si and Mn at low cost and with stability by preventing easily oxidizable metals such as Si and Mn in steel from being concentrated in a surface portion of a steel strip and preventing the formation of oxides of easily oxidizable metals such as Si and Mn.

Continuous annealing system and continuous annealing method

A facility for continuously manufacturing a galvanized steel sheet includes a continuous annealing furnace, a snout, and a galvanization bath. The furnace is divided into a heating zone, a soaking zone, and a cooling zone. The bath is directly connected to the furnace through the snout. The facility has a dewpoint meter and a spray port and a suction port for a furnace gas that are provided in at least one of the zones, gas cyclic paths which connect the spray port and the suction port to a refiner, and a dewpoint meter and a humidification device that are provided in the snout. The gas cyclic paths are separately formed for the respective connected zones. The refiner functions so that a measured value of the dewpoint meter is equal to a target dewpoint, and the humidification device functions so that a measured value of the dewpoint meter in the snout is equal to a target dewpoint for the snout.

Facility having a continuous annealing furnace and a galvanization bath and method for continuously manufacturing hot-dip galvanized steel sheet

According to one embodiment, a semiconductor device includes a semiconductor layer; a plurality of semiconductor regions; second semiconductor region; a first electrode being positioned between the plurality of first semiconductor regions, the first electrode contacting with the semiconductor layer, each of the plurality of first semiconductor regions, and the second semiconductor region via a first insulating film; a second electrode provided below the first electrode, and contacting with the semiconductor layer via a second insulating film; an insulating layer interposed between the first electrode and the second electrode; a third electrode electrically connected to the semiconductor layer; and a fourth electrode connected to the second semiconductor region. The first electrode has a first portion and a pair of second portions. And each of the pair of second portions is provided along the first insulating film.

Semiconductor device and manufacturing method of the same

An information processing apparatus includes a storage unit, a display controller, an input receiver, a job management unit, and a sorting unit. The display controller performs control to display, on a display unit, a job list that is a list of one or more jobs and contains one or more setting items for each job. The input receiver receives selection of a setting item from the list. The job management unit stores, in the storage unit, arrangement orders of setting values of the setting items on the list when selection of the setting item is received. The sorting unit rearranges the jobs such that the setting values of the selected setting item are arranged in a predetermined order while keeping arrangement orders of the setting values of the setting items other than the selected setting item among the jobs in ascending or descending order as stored in the storage unit.

Information processing apparatus, information processing method, and computer program product

A continuous galvanizing line having an annealing furnace of an all radiant tube heating type includes a moisture removal device, dew-point meters, outlets through which the atmospheric gas in the furnace is collected and inlets through which the atmospheric gas from which moisture has been removed with the moisture removal device is fed into the furnace, the dew-point meters and the outlets being placed at least at two points which respectively exist on a side wall in the vicinity of the entrance of the annealing furnace and on a side wall in the vicinity of the furnace top or the furnace bottom at a position where a steel sheet has a maximum end-point temperature, the inlets being placed at two points which respectively exist on side walls on the sides opposite to the sides of the two points for the outlets in the height direction of the furnace, making it possible to steadily control the dew-point of the atmospheric gas to be &#x2212;45&#xb0; C. or lower and &#x2212;80&#xb0; C. or higher throughout the whole area of the annealing furnace.

Continuous galvanizing line having an annealing furnace

Part of an atmosphere gas in a heating zone and/or a soaking zone is sucked out and is cooled through a high-temperature gas passage of a heat exchanger by heat exchange with a gas in a low-temperature gas passage, then cooled through a gas cooler, then dehumidified to a dew point of &#x2212;45&#xb0; C. or less in a dryer, then heated through the low-temperature gas passage of the heat exchanger by heat exchange with a gas in the high-temperature gas passage, and returned to the heating zone and/or the soaking zone. Part of gas flowing from the dryer toward the low-temperature gas passage of the heat exchanger is returned to a cooling zone. These can achieve a low dew point of &#x2212;45&#xb0; C. or less with high energy efficiency.

Method of reducing dew point of atmosphere gas in annealing furnace, apparatus for the same and method of producing cold-rolled and annealed steel sheet

Provided is a vertical annealing furnace, in which a heating zone and a soaking zone are communicated with each other in the upper part of the furnace, in which a part of the furnace other than the communicated parts is separated by a dividing wall, in which part of the furnace gas is suctioned into a refiner having a deoxidation device and a dehumidification device which is placed outside the furnace to decrease the dew point of the gas by removing oxygen and moisture from the gas and such that the resultant gas having a decreased dew point is returned into the furnace, in which a gas suction port into the refiner is located in the lower part of the connection part between the soaking zone and the cooling zone and in which one or more gas suction ports are located in the parts of the heating zone and/or the soaking zone outside of an area within 6 m in the vertical direction and 3 m in the longitudinal direction of the furnace from the steel strip entrance in the lower part of the heating zone.

Continuous annealing furnace for steel strip, continuous annealing method, continuous galvanizing apparatus and method for manufacturing galvanized steel strip (as amended)

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Tokyo, Japan

Nobuyuki Sato