Sumitomo Bakelite Company Limited

Custom Technology Corp.

Nobuyuki Sashida

Takashi Hirano

Toshio Banba

Etsu Takeuchi

Naoshige Takeda

Akira Tokoh

Shunichi Takeuchi

Mitsuhiro Yamamoto

Takahiko Kono

Takehiko Kono

An image compression and restoration technique may be used as a substitute for JPEG. In this technique, orthogonal transforms are performed on the original image signals without interpolation, which means it requires less calculation than JPEG standard. Furthermore, the degradation of the image quality can be suppressed. After that quantization, re-ordering and Huffman coding follow. The Huffman coding is also unique in the sense that unlike JPEG, it uses the data from the previous blocks which results in a more simple, less CPU intensive codec technique. Conversely, the compressed data is restored using a procedure reverse to that of the aforementioned compression technique.

Image signal processing method and device, and storage medium

An improved motion vector detecting method is provided that can ensure a wide search area while suppressing detection of erroneous motion vectors at the same time. Specifically, when detecting motion vectors from a first and a second image frame, the method divides the second image frame into blocks, classifies the blocks into a first and a second group such that the mutually adjacent blocks belong to the different groups. The method specifies a motion vector candidate for each of the blocks in the first and second groups, then performs the process of updating the motion vector candidate by studying an average of the motion vector candidates of the adjacent blocks for each of the blocks in the first and second groups. The process is repeated for a certain time.

Motion vector detecting method and device, and storage medium

By using a polyamic acid ester comprising the following structural units (1a), (1b) and (1c) as a photosensitive resin and a sulfonamide compound or a specific glycol ether acetate as a stabilizer, a photo-sensitive resin composition excellent especially in viscosity stability can be obtained, and by using the above photosensitive resin and a specific developer, a relief pattern of high resolution can be formed. ##STR1## (the symbols in the formulas are as defined in the specification)

Photosensitive polyimide resin composition containing a stabilizer and

A process for producing a photosensitive resin, comprises reacting a diamine with a tetracarboxylic acid tetraester represented by the formula (1) at a temperature of 0.degree. to 50.degree. C. in an aprotic polar solvent: ##STR1## wherein R.sub.1 is a tetravalent organic group; R.sub.2 is a group represented by the formula: ##STR2## in which R.sub.5 is a divalent to hexavalent organic group, R.sub.6 is H or CH.sub.3 and p is an integer of 1 to 5; R.sub.3 is a group represented by --OCH.sub.3, --OC.sub.2 H.sub.5, --OC.sub.3 H.sub.7 or the formula: ##STR3## and R.sub.4 is a group of the formula: ##STR4## the tetracarboxylic acid tetraester of the formula (1) is obtained by subjecting to addition reaction a tetracarboxylic dianhydride, an alcohol compound represented by the formula R.sub.2 H in which R.sub.2 is as defined above and an alcohol compound represented by the formula R.sub.3 H in which R.sub.3 is as defined above and thereafter subjecting the resulting addition reaction product to dehydration-condensation with 1-hydroxy-1,2,3-benzotriazole using a carbodiimide compound as a condensation agent.

Process for producing photosensitive resin

The present invention provides a photosensitive resin composition which comprises as essential components: (A) a polyamic acid having a recurring unit represented by the following formula [I]: ##STR1## wherein 0.5-50 mol % of R.sub.1 consists of a silicone diamine residue represented by the following formula [II]: ##STR2## wherein n represents an integer of 1-50, and the remainder of 50-99.5 mol % of R.sub.1 consists of an organic group selected from the group consisting of an aromatic group, an aliphatic group, an alicyclic group, and a heterocyclic group, and R.sub.2 consists of an organic group selected from the group consisting of an aromatic group, an aliphatic group, an alicyclic group, a heterocyclic group, and a silicone group, and m represents 1 or 2, (B) an amide compound having carbon-carbon double bond, and (C) a photosensitizer. The present invention further provides a semiconductor apparatus in which the above composition is used.

Photosensitive resin composition and semiconductor apparatus using it

The present invention provides a photosensitive resin composition which comprises, as essential components:

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Yokohama, Japan

Nobuyuki Sashida