Hitachi, Ltd.

Hamamatsu-photonics K.k.

Japan Science and Technology Agency

Research Development Corporation of Japan

Nobuyuki Osakabe

Akira Tonomura

Junji Endo

Ken Harada

Tsuneyuki Urakami

Susumu Ozasa

Hiroshi Tsuchiya

Masahiro Tomita

Tsuyoshi Matsuda

Shinji Ohsuka

Takao Matsumoto

Shuji Hasegawa

Chikara Kimura

Tadao Furutsu

Tetsuji Kodama

To prevent the displacement from an optical axis of a charged particle beam from being made independent of the direction (parallel to or perpendicular to the optical axis) of a magnetic field applied to a specimen, a system including an electron microscope and using a charged particle beam optical system is provided with a source of a charged particle beam, a condenser optical system, a specimen to be observed, a system for applying a magnetic field to the specimen, an imaging optical system and an image observation/recording apparatus, is provided with first and second charged particle beam deflection systems in order along a direction in which the charged particle beam travels between the condenser optical system and the specimen, is provided with third and fourth charged particle beam deflection systems in order between the specimen and the imaging lens system, and the quantity and the direction of the deflection of the charged particle beam by each deflection system and the intensity and the bearing of a magnetic field applied to the specimen are related according to predetermined relation.

Specimen observation system for applying external magnetic field

An electrostatic potential in a vacuum in the vicinity of a focused electron beam of a direct wave formed on an optical axis of a back focal plane of an objective lens used in an electron microscope can be externally controlled. Therefore, the electrostatic potential is controlled by supplying an electric potential to a ring-shaped electrode from the outside. The outer sides of the electrode are interposed between both of insulators and conductors so as to shield the electrostatic potential against the outer side of a ring, whereby a phase shift is supplied only to an electron beam that passes through the inside of the ring. A phase-contrast electron microscope can be realized which includes a phase plate corresponding to an electron beam, which is capable of observing a phase object with contrast.

Phase-contrast electron microscope and phase plate therefor

An electron-microscope image viewing apparatus capable of measuring of a moving speed or a vibration frequency of an atomic structure, a magnetic structure, an electric structure or the like of a specimen even when the structure changes at a high rate. The apparatus includes a charged particle source for emitting charged particles, an illuminating electron lens system for illuminating a specimen with a beam of the charged particles, an image magnifying/projecting lens system for magnifying an image of the specimen formed by charged particles scattered upon transmission through the specimen and projecting the magnified image onto an image forming plane, at least one charged particle extracting means provided on the image forming plane of the image magnifying/projecting lens system for taking out the charged particles from a predetermined portion of the charged particle beam projected onto the image forming plane, at least one charged particle detector for detecting the charged particles taken out through the charged particle extracting means, and a signal processing means for processing a signal outputted from the charged particle detector.

Charged particle guide apparatus and image viewing apparatus for charged

In an electron holography apparatus having an electron source, a specimen holder, an electron lens system, and an electron biprism, the electron biprism is so constructed as to be rotatable about the electron optics axis. The rotation angle about the electron optics axis is commanded by the operator of the electron holography apparatus. A central wire of the electron biprism is allowed to be translated in a direction orthogonal to the electron optics axis, thus permitting the application of the fringe scanning method. The center of an aperture is selectively allowed to be aligned with that of the electron biprism to ensure that the measurement apparatus can be used selectively as either the electron holography apparatus or an electron microscope.

Electron optical measurement apparatus

An apparatus forming a reflection electron hologram, wherein a fraction of an electron wave from an electron source illuminate a specimen and caused to be reflected thereat, the remaining electron wave does not illuminate the specimen, but passes aside, the specimen, and the electron wave reflected from the specimen and the electron wave not illuminating, but passes aside, the specimen, are superimposed one upon the other.

Reflection electron holography apparatus

An electron holography apparatus includes an electron microscope which is provided with an electron source, a beam splitter for dividing an electron beam emitted from the electron source into first and second electron beams, and a phase controller for controllably changing a phase difference between the first and second electron beams, and further includes an image detector for detecting an electron interference fringe pattern which varies in accordance with the phase difference between the first and second electron beams, as a picture image, and an image data processor for determining the phase distribution of one of the first and second electron beams from detected image data.

Electron holography apparatus

A field emission type electron microscope using a multi-stage acceleration tube wherein an acceleration voltage to be applied to at least one, always inclusive of a first-stage acceleration electrode, of acceleration electrodes is changed in interlocked relationship with a change in a field emission voltage to be applied to a field emission electrode, so that power of an electrostatic lens can be kept constant.

Growing community of inventors

Kawagoe, Japan

Nobuyuki Osakabe