Toshiba Memory Corporation

Kioxia Corporation

Kabushiki Kaisha Toshiba

Nobuyuki Momo

Fumitaka Arai

Keiji Hosotani

Keisuke Nakatsuka

Yusuke Arayashiki

Motohiko Fujimatsu

Koji Asakawa

Takayuki Ishikawa

Akira Fujimoto

Satoshi Nagashima

Masaki Kondo

Yoshinori Iida

Hidehiro Shiga

Kazutaka Ikegami

Akira Hokazono

Eishi Tsutsumi

Koichi Kokubun

Hisayo S Momose

Rieko Funatsuki

Yosuke Murakami

Masakazu Goto

A memory system for speeding up a read operation in the memory system includes a first pillar, a first string including a first transistor and a first memory cell, a second string including a second transistor and a second memory cell, a first bit line, a first gate line, a first word line, a second gate line, a second word line and a control circuit. When the control circuit executes a read operation with respect to the first memory cell, the control circuit is configured to apply a read voltage to the first word line, apply a voltage turning off the second memory cell regardless of an electric charge stored in the second memory cell to the second word line, apply a voltage turning on the first transistor to the first gate line, and apply a voltage turning on the second transistor to the second gate line.

Memory system

According to one embodiment, a semiconductor device includes a first semiconductor chip including a first metal pad and a second metal pad; and a second semiconductor chip including a third metal pad and a fourth metal pad, the third metal pad joined to the first metal pad, the fourth metal pad coupled to the second metal pad via a dielectric layer, wherein the second semiconductor chip is coupled to the first semiconductor chip via the first metal pad and the third metal pad.

Semiconductor device and manufacturing method thereof

A semiconductor storage device includes a substrate, a first wiring, a second wiring, a third wiring, a fourth wiring, a charge storage unit. The first wiring extends in a first direction along a surface of the substrate. The second wiring is aligned with the first wiring in a second direction intersecting with the first direction and extends in the first direction. The third wiring is in contact with the first wiring and the second wiring and includes a semiconductor. The fourth wiring is located between the first wiring and the second wiring, extends in a third direction intersecting with the first direction and the second direction, and is aligned with the third wiring in at least the first direction. The charge storage unit is located between the third wiring and the fourth wiring.

Semiconductor storage device

According to one embodiment, a semiconductor memory device includes: a first semiconductor layer including first to third portions which are arranged along a first direction and differ in position from one another in a second direction; a conductive layer including a fourth portion extending in the second direction and a fifth portion extending in the first direction; a first insulating layer between the fourth portion and the first semiconductor layer and between the fifth portion and the first semiconductor layer; a first contact plug coupled to the fourth portion; a second contact plug coupled to the first semiconductor layer in a region where the first insulating layer is formed; a first interconnect; and a first memory cell apart from the fifth portion in the first direction and storing information between the semiconductor layer and the first interconnect.

Semiconductor memory device having a memory cell and semiconductor layer

According to one embodiment, a semiconductor memory device includes: first to fifth interconnects; a semiconductor layer having one end located between the fourth interconnect and the fifth interconnect and other end connected to the first interconnect; a memory cell; a conductive layer having one end connected to the second interconnect and other end connected to the semiconductor layer; a first insulating layer provided to extend between the third and fourth interconnects and the semiconductor layer, and between the fifth interconnect and the conductive layer; an oxide semiconductor layer provided to extend between the fourth and fifth interconnects and the first insulating layer; and a second insulating layer provided to extend between the fourth and fifth interconnects and the oxide semiconductor layer.

Semiconductor memory device

According to one embodiment, a semiconductor memory device includes: a first interconnecting layer; a first signal line; a first memory cell that stores first information between the first interconnecting layer and the first signal line; second to fourth interconnecting layers provided above the first interconnecting layer; fifth to seventh interconnecting layers disposed apart from the second to fourth interconnecting layers; a second signal line coupled to the first signal line; a third signal line coupled to the first and second signal lines and the sixth interconnecting layer; and, first to fifth transistors.

Non-volatile semiconductor memory device

A storage device includes: a substrate; a first conductive layer extending in a first direction; a second conductive layer adjacent to the first conductive layer in a second direction, and extending in the first direction; a third conductive layer extending in a third direction; a fourth conductive layer extending in the second direction; a fifth conductive layer disposed on the second conductive layer, extending in the third direction, and being electrically connected to the fourth conductive layer; a first storage layer disposed between the third conductive layer and the fourth conductive layer; a first semiconductor layer disposed between the first conductive layer and the third conductive layer; a second semiconductor layer disposed between the second conductive layer and the fifth conductive layer; and a first gate electrode extending in the second direction and being shared by side surfaces of the first semiconductor layer and the second semiconductor layer.

Storage device

Certain embodiments provide a solid-state imaging device including: a semiconductor substrate of a first conductivity type having a first face and a second face that is the opposite side from the first face; a plurality of pixels provided on the first face of the semiconductor substrate, each of the pixels including a semiconductor region of a second conductivity type that converts incident light into signal charges, and stores the signal charges; a readout circuit provided on the second face of the semiconductor substrate to read the signal charges stored in the pixels; an ultrafine metal structure placed at intervals on a face on a side of the semiconductor region, the light being incident on the face; and an insulating layer provided between the ultrafine metal structure and the semiconductor region.

Solid-state imaging device

Growing community of inventors

Mie, Japan

Nobuyuki Momo