Mitsubishi Denki Kabushiki Kaisha

Nobuyuki Kosaka

Toshimasa Tomoda

Hitoshi Tanaka

Yoko Miyazaki

Hiroshi Ohnishi

Takeshi Iwamoto

Shigeo Sasaki

Yoshihiko Kusakabe

Kouichirou Tsutahara

Kazuo Yoshida

Yoshimi Kinoshita

Kenichiro Yamanishi

Toshihiko Noguchi

Masao Koshinaka

Taizo Eshima

Toyomi Ohshige

Tomoyuki Kanda

Katsuhisa Kitano

Hideki Komori

Toru Takahama

Takehiko Nakahara

Masahiko Sakamoto

Hiroshi Mitsuda

Yoshinori Ito

It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer (1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.

Semiconductor producing apparatus, and wafer vacuum chucking device, gas

It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer(1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.

Semiconductor producing apparatus comprising wafer vacuum chucking device

A code reading pattern and an image pickup apparatus are provided for reading a symbol representing significant information, the symbol encoded by the pattern. The code reading pattern is formed by repeated markings of constant pitch on the surface of an object. The markings define area having at least one boundary, the at least one boundary defining an outline of the symbol. The apparatus includes a lighting system for illuminating the code reading pattern with parallel light, an imaging system for imaging light reflected from the pattern, a spatial frequency filtering system, located at the near back focal plane of the imaging system, for blocking regular reflected light and for transmiting diffracted light to project an image of the symbol, and a receiver for receiving the image.

Code reading pattern and an image pickup apparatus for reading the

A spatial frequency filter used in a pattern defect detection device, including a pattern which includes a black spot having a diameter expanded by a controlled amount in comparison with the diameter of a black spot on a photosensitive plate obtained by exposure by diffracted light from a pattern on a model specimen.

Method of manufacturing a spatial frequency filter for use in a pattern

A light transmission type vacuum separating window for separating a vacuum area into a plurality of vacuum areas through a film that transmits the light of a wavelength area such as an X-ray area and an infrared ray area. This vacuum separating window includes a thin film that transmits the light. The vacuum area is separated into the plurality of vacuum areas through this thin film. The light is any one of an X-ray, an infrared ray, a visible ray and an ultraviolet ray. A metal or an alloy that turns out a liquid in a range of temperature of a using environment may be provided between the thin film and the support member for supporting the thin film. This metal is preferably gallium. The alloy preferably contains gallium and, more preferably, consists of 75.5 weight % gallium and 24.5 weight % indium.

Light transmission type vacuum separating window and soft X-ray

This invention relates to a method and apparatus for analyzing a plurality of elements that are present on the surface of a material of interest or in its neighborhood, as well as a thin-film forming apparatus that is capable of measuring the composition of a sample during thin film formation in the process of semi-conductor fabrication. The apparatus are characterized in that a detector is isolated from the light and heat generated in a sample making mechanism by means of a shield which is not only heat-resistant but also transmissive of fluorescent X-ray containing soft X-rays of 1 Kev and below and that a mirror for total reflection of X-rays which is equipped with slits capable of adjusting the incident and exit angles of fluorescent X-rays from the sample excited with an excitation source as well as the ranges of those angles is provided either at the entrance or exit of said shield or at both.

Thin film forming apparatus

A spatial frequency filter used in a pattern defect detection device, including a pattern which includes a black spot having a diameter expanded by a controlled amount in comparison with the diameter of a black spot on a photosensitive plate obtained by exposure by diffracted light from a pattern on a model specimen

Pattern defect detection device and a spatial frequency filter used

An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam is guided to a semiconductor wafer having a periodic pattern thereon by mirrors and a beam expander. The light scattered from the specimen is collected by a lens on a photographic plate. The reference beam is guided to the photographic plate via a second beam expander and another mirror. The intensity of the reference beam is adjusted to a level at which the reference beams interferes on the photographic plate with the light scattered from defects in the periodic pattern and collected by the lens. Thus, a hologram of the defects in the pattern is recorded on the photographic plate. After development, the photographic plate is returned to its original position and used to form a holographic image of the defects with a transmitted regeneration light beam.

Inspection device for detecting defects in a periodic pattern on a

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Amagasaki, Japan

Nobuyuki Kosaka