Toshiba Mitsubishi-Electric Industrial Systems Corporation

Tmeic Corporation

Nobuyoshi Namito

Takahiro Hiramatsu

Hiroyuki Orita

Yusuke Iwao

Inside a heating space of a heating chamber, a first heating treatment of moving a substrate along a substrate moving direction is performed by a first conveyor. After that, first conveyance processing of moving the substrate along a conveying direction is performed by a second conveyor. At this time, source mist is sprayed on the substrate by first thin film forming nozzles. Subsequently, second heating treatment is performed by a third conveyor. After that, second conveyance processing is performed by a fourth conveyor. At this time, source mist is sprayed on the substrate by second thin film forming nozzles.

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Tokyo, Japan

Nobuyoshi Namito