Fujifilm Business Innovation Corp.

Fuji Xerox Co., Ltd.

Renesas Electronics Corporation

Nobuyoshi Hattori

Tomonori Sato

Isamu Adachi

Miho Morita

Tomomi Ishida

Tsuyoshi Mabara

Kyoya Nitta

Makoto Ishikawa

Nobuto Nakanishi

Hiroyuki Arie

Kimio Hara

Nobuaki Umemura

A transport device includes: a container portion that accommodates a transportable member; a receiving portion disposed above or below the container portion to at least partially overlap the container portion in a plan view, to receive the transportable member; a transport path along which the transportable member accommodated in the container portion is transported to the receiving portion; a first enlargement portion disposed at the container portion, the first enlargement portion moving in a direction opposite to a transport direction in which the transportable member is transported from the container portion to the transport path to enlarge a container area in the container portion for receiving the transportable member; and a second enlargement portion disposed at the receiving portion, the second enlargement portion moving in the opposite direction in conjunction with a movement of the first enlargement portion in the opposite direction to enlarge a container area in the receiving portion for receiving the transportable member.

Transport device, document reading device, and image forming apparatus

A document reading device includes: a device body; a transport path that is provided in the device body and through which a document is transported; a reading unit that is provided in the device body, has a reading surface, and reads an image of a document transported through the transport path; a moving part that is provided in the device body and is capable of being moved to a covering position at which the moving part covers the reading surface and to an exposing position at which the moving part exposes the reading surface; a first opening and closing part that is provided on the device body so as to be opened and closed and opens the transport path, at a first opening position; and a second opening and closing part that is provided beside the device body so as to be opened and closed or so as to be removable and mountable and exposes the moving part, at a second opening position or a removal position.

Document reading device and image forming apparatus

A sheet processing apparatus includes a feed-in path through which a sheet is fed, a first transport path through which a sheet fed from the feed-in path is transported, and a second transport path through which a sheet fed from the feed-in path is transported. The sheet processing apparatus also includes the following elements. A first processor sequentially stacks sheets output from the first transport path and performs first processing on a bundle of stacked sheets. A second processor sequentially stacks sheets output from the second transport path and performs second processing, which is different from the first processing, on a bundle of stacked sheets. A common retention path causes a sheet fed through the feed-in path to temporarily remain on the common retention path and causes the sheet temporarily remaining on the common retention path to be output to one of the first and second transport paths.

Sheet processing apparatus and image forming system

In a semiconductor device having an LDMOSFET, a source electrode is at the back surface thereof. Therefore, to reduce electric resistance between a source contact region in the top surface and the source electrode at the back surface, a poly-silicon buried plug is provided which extends from the upper surface into a P-type substrate through a P-type epitaxial layer, and is heavily doped with boron. Dislocation occurs in a mono-crystalline silicon region around the poly-silicon buried plug to induce a leakage failure. The semiconductor device has a silicon-based plug extending through the boundary surface between first and second semiconductor layers having different impurity concentrations. At least the inside of the plug is a poly-crystalline region. Of the surface of the poly-crystalline region, the portions located on both sides of the foregoing boundary surface in adjacent relation thereto are each covered with a solid-phase epitaxial region.

Semiconductor device and method of manufacturing the same

Growing community of inventors

Kanagawa, Japan

Nobuyoshi Hattori