Tokyo Shibaura Denki Kabushiki Kaisha

Nobuo Okuda

Shigeki Shibayama

Yutaka Hidai

Kazuhide Iwata

A data processor used with a host computer is constructed by a plurality of memory units, at least one arithmetic and logic unit, a register file and a microprogram memory for storing microprograms to control these circuit components. The first field of each microinstruction of the microprogram is supplied to a first logic converting circuit of which the output signal drives each memory unit. The third field of the microinstruction is supplied to the second logic converting circuit of which the output signal causes the data stored in selected registers of the register file to be supplied to the arithmetic and logic unit. The arithmetic and logic unit operates upon the data supplied in accordance with the designation by the second field, and loads the result of the operation into the register specified by one of the outputs of the second logic converting circuit. Each logic converting circuit alters, in accordance to the control signal designated from the exterior, a combination of the corresponding field of a microinstruction.

Data processor

An exposure apparatus using an electron beam includes a first memory for storing pattern data representing various basic patterns, a data processor for reading from the first memory the pattern data necessary to form a pattern to be drawn, a second memory for storing data which correspond to the pattern data readout from the first memory by the data processor, and an electron beam generator for generating an electron beam according to the data stored in the second memory to achieve a raster scanning on a test piece. The first memory stores pattern parameters representing said various basic patterns. The exposure apparatus further includes a dot pattern data generator which writes into the second memory dot pattern data which correspond to the pattern parameters readout from the first memory by the data processor.

Exposure apparatus using electron beams

An electron beam type exposure apparatus includes an electron generator for emitting electron beams modulated in accordance with dot data read out of a memory, a drive unit for vertically moving a table carrying a workpiece on which a pattern is to be drawn, and a scanning unit for scanning the surface of the workpiece by electron beams. The exposure apparatus further includes an image selection circuit for judging from dot pattern data read out of the memory whether a pattern to be drawn on the workpiece represents a regular or mirror image, and the dot data are read out of the memory in the order defined by the direction in which the workpiece-carrying table is moved and also by an output logic signal from the image selection circuit.

Electron beam type exposure apparatus

Apparatus for calculating a plurality of interpolation values is adapted to calculate linear interpolation values, consisting of a second data train, from a first data train and includes a memory for storing the first data train and a calculator for calculating the interpolation value from the corresponding two data in the first data train read out of the memory. The calculator comprises an n-bit register for designating those addresses of the memory where data to be read out of the upper m-bit section of the n-bit register is stored and for determining weighted factor data for calculating the interpolation value at the lower (n-m) bit section of the register, a calculating unit for calculating the interpolation value from the data read out of the memory and the weighting coefficient data, an adder for adding a position increment value for designating the adjacent interpolation value to the register each time each interpolation value is calculated at the calculating unit, and a counter stepped one count for each calculation of each interpolation value and adapted to send an end signal to a central processing unit when a predetermined number of counts are completed. The memory, register, adder and counter are controlled by the central processing unit.

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Yokohama, Japan

Nobuo Okuda