Fujitsu Corporation

Nobuo Iijima

Yoshio Watanabe

Motoichi Watanuki

Tadashi Kiriseko

Mitsumasa Oshiki

Tatsuro Kawabata

Kazuo Shimane

Akihisa Hayashida

Masayasu Nagashima

According to a method of manufacturing a magnetic head, a magnetoresistive device is formed on a substrate, a top end portion of the magnetoresistive device is placed in an external magnetic field, and a height of the magnetic head is adjusted by ceasing a polishing operation at an instant when change in resistance of the magnetoresistive device relative to change in the external magnetic field comes up to a predetermined value.

Magnetoresistive type magnetic head and method of manufacturing the same and apparatus for polishing the same

A tape-on-wafer mounting apparatus and method for mounting a dicing tape on a wafer. The wafer stage mounts a wafer in the hole, which is constructed such that, when the wafer is mounted there, the wafer top surface stands higher than the wafer stage surface, with the wafer surface on which chip circuits are fabricated faced down. The tape stage mounts a dicing tape on its ring with the tape surface on which adhesives are applied faced down. The tape pressing tool presses the tape stage on the wafer stage so that the tape presser, which is constructed such that vertical force exerted by it is the largest at its center and smaller with the increase in distance from the center, causes the dicing tape to stick to the wafer.

Tape-on-wafer mounting apparatus and method

A wafer positioning apparatus includes at least first, second and third optical position detectors for detecting a circumference portion of a wafer. The first to third optical position detectors are arranged on a circumference of a circle having a diameter identical to that of the wafer. A transportation robot is used for holding the wafer and moving the held wafer with respect to the first to third optical position detectors. A control circuit controls the transportation robot in accordance with output signals of the first to third optical position detectors so that all of the first to third optical position detectors detect the circumference portion of the wafer at the same time.

Wafer positioning apparatus

In an automatic wafer process for gate array integrated circuits, it becomes necessary to identify the wafer every time at the beginning of each process. However, it is difficult for conventional methods to identify the wafer by detecting a bar code pattern because of a low contrast due to reflection of the deposited layers. The present invention provides a method in which the light source, which abundantly includes infrared rays, located on the back side of the wafer and a detector located on the front side thereof. The infrared rays are irradiated onto the wafer easily penetrate the silicon wafer. The infrared rays are received without an effect of reflection due to the deposited layers on the front side of the wafer. The first metallization layer is a very suitable layer to form the bar code pattern, which is easily marked by a laser beam scriber.

Methods for identifying semiconductor wafer with bar code pattern

A method for transporting an article disposed on an upper surface of a stage in a vacuum. Gas is ejected through a plurality of inclined nozzles formed in the stage so that the article is transported in the direction of inclination of the nozzles.

Method and apparatus for transporting an article in vacuum

An automatic focus control device for adjusting the height of a lens above a surface of a workpiece used in an exposure apparatus for exposing the sample with a light beam including a first light emitting device for emitting a first light ray to a sample; a second light emitting device for emitting a second light ray to the sample. First and second light detecting devices for detect the second and first light rays reflected by a surface of the sample, respectively. The first and second light detecting device have a plurality of light detecting elements. A discriminating device discriminating between an inclination of the sample and a variation of the height of the lens above the surface of the sample on the basis of an output of the first and second light detecting devices. The first light emitting device and the first light detecting device are symmetrically located with respect to the second light emitting device and the second light detecting device in relation to a center axis of a light beam for exposing the sample.

Automatic lens focus with respect to the surface of a workpiece

An optical apparatus wherein a mirror is mounted on a stage. On such stage a supporting portion is provided and the mirror is fixed such to supporting portion at a single portion of the mirror. At the free end portions of the mirror, which are not fixed to the stage, the end surface is in contact with a buffering member.

Optical apparatus having a mirror

An apparatus with a vacuum system, said vacuum system including a vacuum chamber adapted to contain main instruments of the apparatus, and an exhaust device adapted to exhaust air from the vacuum chamber, which apparatus comprises a structure for vibration isolation adapted to prevent the transmission of the vibration of the exhaust device to a main section of the apparatus, the exhaust device of the structure comprising a bellows connected with the vacuum chamber, an exhaust tube connected with the bellows and a vacuum pump attached to the exhaust tube; and the bellows, the exhaust tube and the vacuum pump are arranged to construct a pendulum system in which the bellows is adapted for a fulcrum, whereby the vibrations of the vacuum pump are absorbed by the pendulum system and do not reach the main section of the apparatus. Other structure for providing additional guidance and dampening of the pendulum system may also be provided.

Structure for vibration isolation in an apparatus with a vacuum system

An electron beam irradiation apparatus which comprises: a base plate of a magnetically permeable material; a movable stage mounted on said base plate; an upper magnetic shield plate having an electron beam passage hole disposed above said stage; a side member of high permeability which magnetically interconnects said base plate and said upper shield plate, and; a magnetic shield cover plate which covers the table surface of said stage.

Growing community of inventors

Kanagawa, Japan

Nobuo Iijima