Jsr Corporation

Japan Synthetic Rubber Co., Ltd.

Sharp Corporation

Nobuo Bessho

Hiroaki Nemoto

Hideaki Masuko

Kenji Yamada

Atsushi Kumano

Isao Nishimura

Yasuaki Yokoyama

Tsutomu Shimokawa

Tadahiko Udagawa

Masayuki Endo

Yusuke Tsuda

Yusuke Tajima

Atsufumi Shimada

Noriko Watanabe

Shigeaki Mizushima

Hiroko Iwagoe

Seiji Makino

Kimiyasu Sano

Sigeo Kawamura

Michinori Nishikawa

Keiji Konno

Masaaki Hanamura

Shozo Nishida

Masayuki Endoh

Fumitaka Takinishi

Fumitake Takinishi

Fumine Shitani

Yasumi Wanibe

Satoshi Iwamoto

A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer. The composition allows its dielectric constant to be changed by a simple method, has a sufficiently large difference between its changed dielectric constant and its original dielectric constant and can provide a dielectric constant pattern and an optical material which are stable regardless of their use conditions.

Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern

The present invention relates to a method of temporarily and firmly fixing two solids to each other and to a composition used in the method, which is a method of temporarily fixing, comprising temporarily fixing the two solids to each other with a liquid crystal compound or a composition comprising the liquid crystal compound. This method is used for a method of temporarily fixing a pad for chemical mechanical polishing, for example, to polish a wafer for a semiconductor device fixed on a surface of a base plate, when one solid is a pad for chemical mechanical polishing of a wafer for a semiconductor device and the other is a base plate to fix the pad.

Composition and method for temporarily fixing solid

To provide a refractive index pattern and an optical material whose refractive indices are changed by a simple method, which have a sufficiently large refractive index difference and which are stable irrespective of their use conditions, and a method of forming these. A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium or tetramethoxysilane, or a halogen compound such as tetrachlorosilane and (C) a radiation sensitive decomposer; and a method of producing a refractive index pattern and an optical material, using the above radiation sensitive refractive index changing composition.

Radiation-sensitive composition changing in refractive index and utilization thereof

A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

Radiation-sensitive composition changing in refractive index and method of changing refractive index

A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

Radiation-sensitive composition capable of having refractive index distribution

A process for forming an inorganic material layer pattern on a substrate. The process includes the steps of transferring an inorganic powder dispersed paste layer supported on a support film to the surface of the substrate to form the inorganic powder dispersed paste layer on the substrate; forming a resist film on the inorganic powder dispersed paste layer transferred to the surface of the substrate; exposing the resist film to light through a mask to form a latent image of a resist pattern; developing the exposed resist film to form the resist pattern; etching exposed portions of the inorganic powder dispersed paste layer to form an inorganic powder dispersed paste layer pattern corresponding to the resist pattern; and baking the pattern to form an inorganic material layer pattern.

Process of forming a pattern on a substrate

A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern

Radiation sensitive refractive index changing composition and refractive index changing method

A process for the preparation of an electrode, which comprises: (1) transferring a conductive paste layer supported on a base film to a substrate to form the conductive paste layer on the substrate; (2) forming a resist film on the conductive paste layer transferred to the substrate; (3) exposing the resist film through a mask to form a resist pattern latent image; (4) developing the exposed resist film to form a resist pattern; (5) etching exposed portions of the conductive paste layer to form a conductive paste layer pattern corresponding to the resist pattern; and (6) thermosetting the pattern to form a conductive layer pattern.

Electrode formation process

The present invention provides a pigment dispersed color-filter composition containing a binder polymer such as an alkali-soluble block copolymer; a radiation-sensitive compound; and a pigment. The pigment-dispersed color-filter composition which further contains an organic medium, or an organic medium and a carboxylic acid is also provided.

Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder

A radiation sensitive composition for color filters comprising (A) a colorant, (B) a binder polymer, (C) a poly-functional monomer, (D) a photopolymerization initiator containing at least one biimidazole compound typified by 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-biimid azole and 2,2'-bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and (E) a solvent. The composition can be used for the manufacture of color filters exhibiting excellent photographic sensitivity and superior contrast, while effectively controlling production of residual insoluble material during development process.

Radiation sensitive composition for color filters

A radiation-sensitive composition which comprises (A) a binder polymer which is a copolymer comprising (A-1) a monomer containing an alcoholic hydroxyl group, (A-2) a macromonomer, and (A-3) other monomer copolymerizable with the above monomers; (B) a pigment, and (C) a radiation-sensitive compound. This radiation-sensitive composition is suited as a color-dispersed composition for a color filter which does not cause surface soiling and which has an excellent adhesion of a formed pixel to a glass substrate.

Pigment-dispersed radiation-sensitive composition for color filters

A radiation sensitive composition containing a fluorescent substance dispersed therein, comprising (A) the fluorescent substance, (B) an organic polymer binder, (C) at least one optically crosslinkable compound selected from optically crosslinkable monomers and oligomers, and (D) an optically radical-generating agent which comprises (a) a 2,4,5-triaryl imidazole dimer, (b) an amino group-containing benzophenone photosensitizer, and (c) a thiol compound represented by the following formula (1): ##STR1## wherein Z is --O--, --S--, --NH-- or --CONH--. This radiation sensitive composition can provide a fluorescent screen having a larger film thickness and a higher display brightness and hence, will greatly contribute to increases in the size and precision of a fluorescent display device such as a plasma display panel.

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Tokyo, Japan

Nobuo Bessho