Nippon Oil Company

Nippon Oil Corporation

Kabushiki Kaisha Toshiba

The Furukawa Electric Co., Ltd.

Tokyo Gas Company Limited

Showa Electric Wire & Cable Co., Ltd.

Nobuo Aoki

Shinichiro Suzuki

Shozo Tsuchiya

Toshio Waku

Masakazu Ikeda

Hiroyuki Seki

Mitsuo Matsuno

Hisatake Sato

Satoru Murase

Hachio Shiraki

Masahiro Higashi

Toshiyuki Enomoto

Tomoyuki Kumano

Masamitsu Ichihara

Eigen Suzuki

Yoshimasa Kamisada

Shinchiro Suzuki

Ikuo Aizawa

Keisuke Yokoi

Hideo Negishi

Provided is a process and catalyst for hydrocracking paraffinic hydrocarbons which provides satisfactorily high cracking activity and middle distillate yield as well as the low pour point of the resulting gas oil all together. The catalyst of the present invention comprises a crystalline aluminosilicate, alumina-boria and a noble metal of Group VIII of the Periodic Table.

Process for producing liquid hydrocarbon with hydrocracking catalyst

A catalyst is provided which is low in methane selectivity in a high CO conversion region and high in chain growth probability &#x3b1; in a Fischer-Tropsch synthesis and comprises a support comprising silica or alumina and an oxide of zirconium and/or titanium loaded thereon in film form in an amount ranging from 0.5 percent by mass to 10.0 percent in terms of metal, and one or more metals selected from the group consisting of cobalt, nickel and ruthenium loaded on the support.

Catalyst for Fischer-Tropsch synthesis and process for producing hydrocarbons

A photosensitive material comprising a photosensitive-group-containing fullerene such as a photosensitive material which is obtained by adding a photosensitive group to fullerene and/or a photosensitive material which is obtained by combining the fullerene with a photosensitive agent is provided. The photosensitive material according to the present invention has excellent properties as a new resist which is a photosensitive material suitable as a photolithographic resist for the production of semiconductors utilizing such light source as ultraviolet light, deep ultraviolet light, X-ray or electron beam and which meets the requirements for realization of a higher level of resolution and sensitivity.

Photosensitive materials comprising fullerene

Compositions of high lubrication and light coloration are disclosed in which a selected class of resins and rubbers is blended with a specified cured polybutadiene product. The cured product results from crosslinking more than 10% of vinyl bonds in a butadiene polymer having a vinyl bond content of not less 20% by mol in terms of its monomer unit. Also disclosed are solid lubricants comprising a specified fluorinated cured polybutadiene and compositions containing the solid lubricant.

Solid lubricant and composition

Power supplying unit for submerged motor

A particulate polybutadiene crosslinked material is disclosed along with a process of making the same. The particulate material has a substantially spherical, uniformly shaped configuration and comprises at least part of its surface layer occupied by a reaction product of polybutadiene and a silicone compound.

Particulate polybutadiene crosslinked material

Lubricant compositions of high lubrication and light coloration characteristics are made up essentially of a selected mineral or synthetic oil and a selected polybutadiene. The polymeric component contains greater than 20% by mol of vinyl bonds in terms of its monomeric unit and has crosslinked more than 10% of the vinyl bond content.

Lubricant compositions

Thermosetting polymers predominantly of a polybutadiene as a base polymer is disclosed, which polybutadiene is so configured as to have a vinyl content of not less than 40% by mol of the total monomer mol and a crosslink reactivity of at least 70% of the vinyl content. The cured polymer is ultrahighly resistant to heat and particularly applicable as an engineering plastics. Also disclosed is a process for producing the thermosetting polymer with the use of a specific initiator.

Thermosetting polymer of ultrahigh resistance to heat

A positive type photoresist material comprises a polymer having structural units each represented by the following formula (I) of; ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.6 represents a hydrogen atom or a hydrocarbon residue having 1 to 12 carbon atoms, each or R.sup.4 and R.sup.5 represents a hydrogen atom, a hydroxyl group or a hydrocarbon residue having 1 to 12 carbon atoms and Z represents--CH.sub.2 --.sub.n which n indicates an integer of 0 to 4.

Positive type photoresist material

An improved multifilament superconductor is fabricated by the method in which a tin rod or tin based alloy rod is clad with a copper based alloy tube, the thus obtained copper-clad rod is further clad with a niobium based alloy tube, and a copper material is applied as a stabilizer on an outer peripheral surface of the niobium based alloy tube to form a composite. This composite is then reduced and thermally treated at a temperature ranging from 640.degree. to 770.degree. C. to thereby form an Nb.sub.3 Sn superconductor composite with a filament tube therein. At least one of the copper based alloy tube and the niobium based alloy tube contains 0.1-5.0 at. % titanium, and in addition, the tin based alloy rod may contain 0.1-3.5 at. % titanium. The tin is contained in the copper-clad rod at weight % of about 25-85, preferably 30-80 weight %.

Method of fabricating multifilament superconductors

Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R.sub.4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.

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Yokohama, Japan

Nobuo Aoki