Orc Manufacturing Co., Ltd.

Nobuo Adachi

Shinya Ogawa

Yasuhiko Okugi

Yoshihiro Mochida

Ichiro Shirahama

The present invention is designed to provide a high intensity light irradiation apparatus having a simpler, lighter, easy to assemble and replace support member for a dielectric barrier electrical discharge lamp. The dielectric barrier electrical discharge lamp,comprises concentric outer tube,and inner tube,to form an inert gas filled electrical discharge space,defined by the outer and inner tubes,and their end walls. A metal rod,is inserted into the inner tube,of the electrical discharge lamp,A pair of clamp members,are secured to both ends of the metal rod,for clamping the both ends of the electrical discharge lamp,. An AC voltage is applied between the metal rod,and an outer electrode,on the surface of the outer tube,. Cooling water flows through the gap between the metal rod,and the inner tube

High intensity light irradiation apparatus

An exposure apparatus comprising lighting means such as ultra-violet lamp and reflecting mirror placed in an exposure room and also tray arranged to move in and out from the exposure room, wherein cooling means is provided. The cooling means blows cold air onto the surface of the tray. A cooling room is formed next to the exposure room. The cooling means is composed of air radiator and air fan. Refrigerant such as cold water passes through the air radiator and the air fan blows air in the cooling room onto the surface of the tray through the radiator. Exhaust fan arranged to send air in the exposure room into the cooling room is also provided between the exposure room and the cooling room.

Exposure apparatus

A film thickness measuring apparatus comprising an optical measuring system and an optical projecting system is disclosed. The conventional optical measuring system includes a light source, a first optical system, a monochromator, a second optical system and a photomultiplier tube andmonochromatic light is emitted from the first optical system toward the surface of the film layer on a material of which film thickness is to be measured. While reflection interference takes place between light reflected at the surface of the film layer and light reflected at the base plate, reflected light beam is transmitted to the photomultiplier tube via a semitransparent mirror so that the thickness of the film layer is measured. Before measuring of the film thickness is initiated, there is necessity for determining the correct position of the material to be measured. To this end the optical projecting system includes a third optical system adapted to emit light toward the surface of the film layer via a turnable mirror and reflected light is then transmitted to a screen via the turnable mirror so as to visually observe an image of the material in an enlarged scale. Thus, when film thickness is to be measured, the turnable mirror is caused to assume the inoperative position by turning operation.

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Chofu, Japan

Nobuo Adachi