Kurita Water Industries Ltd.

Nobuko Gan

Yu Fujimura

Hiroshi Morita

Hiroto Tokoshima

An apparatus has a platinum group metal carrying resin column provided in a supply line of ultrapure water, and has a pH adjuster injection device and a redox potential adjuster injection device provided in a later stage thereof. The apparatus has a membrane-type deaeration apparatus and a gas dissolving membrane apparatus sequentially provided in a later stage of the devices, and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are each provided at some midpoint in the discharge line, and the pH meter and the ORP meter are connected to a control device. Then, the control device controls the amount of adjusters to be injected from the pH adjuster injection device and the redox potential adjuster injection device, on the basis of the measurement results of the pH meter and the ORP meter.

Apparatus for producing aqueous pH- and redox potential-adjusting solution

A diluted chemical liquid production apparatus has a structure that has a platinum group metal carrying resin column, a membrane-type deaeration apparatus and a gas dissolving membrane apparatus, which are sequentially provided in a supply line of ultrapure water; and has a pH adjuster injection device and an oxidation-reduction potential adjuster injection device, which are provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gaseous phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to the gaseous phase side of the gas dissolving membrane apparatus; and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are provided in the discharge line. Such a diluted chemical liquid production apparatus can control a pH and an oxidation-reduction potential.

Diluted chemical liquid production apparatus capable of controlling pH and oxidation-reduction potential

A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a cleaning water line for causing the cleaning water to flow, cleaning machines to which the cleaning water is supplied from the cleaning water line, a solute removal unit into which excess cleaning water is introduced from the cleaning water line, and a collecting line for returning collected water from which the solute is removed to a tank and the like.

Cleaning water supply device

A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a storage tank for the cleaning water, cleaning machines to which the cleaning water is supplied from the storage tank, and a controller that controls the cleaning water production unit so that a water level in the storage tank is in a predetermined range.

A dilute chemical solution producing apparatus includes, in a supply line of ultrapure water, a platinum group metal carrying resin column, a membrane-type deaeration apparatus, and a gas dissolving membrane apparatus, and a washing chemical solution injection apparatus is provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gas phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to a gas phase side of the gas dissolving membrane apparatus. A discharge line communicates with the gas dissolving membrane apparatus. With such a dilute chemical solution producing apparatus, a dilute chemical solution with both dissolved oxygen and dissolved hydrogen peroxide being removed can be safely produced and supplied in a washing step for semiconductor washing.

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Tokyo, Japan

Nobuko Gan