Canon Kabushiki Kaisha

Nobuki Yoshimatsu

Junichi Seki

Susumu Yasuda

Takao Kusaka

Masahiko Okunuki

Taiko Motoi

Haruhito Ono

Shinan Wang

Toshiaki Aiba

Kenji Tamamori

A method of manufacturing a nano structure by etching, using a substrate containing Si. A focused Ga ion or In ion beam is irradiated on the surface of the substrate containing Si. The Ga ions or the In ions are injected while sputtering away the surface of the substrate so that a layer containing Ga or In is formed on the surface of the substrate. Dry etching by a gas containing fluorine (F) is performed with the layer containing the Ga or the In formed on the surface of the substrate taken as an etching mask, and the nano structure is formed having a pattern of at least 2 &#x3bc;m tin in depth according to a predetermined line width.

Method of manufacturing a nano structure by etching, using a substrate containing silicon

In a scanning probe apparatus capable of always effectively canceling an inertial force to suppress vibration even in repetitive use while replacing a sample holding table or a probe, a stage for a sample or the probe includes a drive element for moving the sample holding table and movable portions movable in a direction in which an inertial force generated during movement of the sample holding table. The stage is configured so that the drive element, the movable portions, and the sample holding table or the probe are integrally detachably mountable to a main assembly of the scanning probe apparatus.

Scanning probe apparatus

A nano structure formed on the surface of a substrate containing Si and having a pattern of at least 2 &#x3bc;m in depth, in which Ga or In is contained in the surface of the pattern, and the Ga or the In has a concentration distribution that an elemental composition ratio Ga/Si or In/Si of Si and Ga or In detected by an X-ray photoelectron spectroscopy is at least 0.4 atomic percent in the depth direction of the substrate, and the maximum value of the concentration is positioned within 50 nm of the surface of the pattern.

Nano structure and method of manufacturing nano structure

A scanning probe apparatus for obtaining information of a sample, recording information in the sample, or processing the sample with relative movement between the sample and the apparatus, the apparatus is constituted by a probe; and a scanning stage including a drive element for moving a sample holding table for holding the sample and a movable portion movable in a direction in which an inertial force generated during movement of the sample holding table is cancelled. The scanning stage further includes a memory for storing characteristic information of the scanning stage and is detachably or replaceably mountable to a main assembly of the apparatus.

A drive stage for a scanning probe apparatus includes a supporting member, a plurality of movable portions fixed to the supporting member, and a plurality of drive elements configured and positioned to drive the plurality of movable portions. The drive stage is driven in a direction in which inertial forces of the plurality of movable portions are mutually canceled during drive of the plurality of drive elements. The drive stage further includes an inertial force difference detection member configured and positioned to detect a difference in inertial force between the plurality of movable portions, and an inertial force adjustment member configured and positioned to effect inertial force adjustment so that the difference in inertial force between the plurality of movable portions is decreased on the basis of a detection output of the inertial force detection member.

Drive stage for scanning probe apparatus, and scanning probe apparatus

A scanning probe apparatus for obtaining information of a sample, recording information in the sample, or processing the sample with relative movement between the sample and the apparatus, the apparatus is constituted by a probe; and a scanning stage including a drive element for moving a sample holding table for holding the sample and a movable portion movable in a direction in which an inertial force generated during movement of the sample holding table is cancelled. The scanning stage further includes a drive circuit for driving the scanning stage and is detachably or replaceably mountable to a main assembly of the apparatus.

A scanning probe apparatus for obtaining information of a sample or processing the sample with relative movement between the sample and the apparatus includes a sample stage for holding the sample, and a drive stage with a probe, a cantilever supporting the probe, a cantilever holding member for holding the cantilever, and a drive element for driving the probe in three directions perpendicular to each other. In addition, a movable portion surrounds the drive element and is positioned outside of the drive element, with the movable portion movable in a direction in which an inertial force generated during movement of the probe is canceled. The drive stage includes an optical path, through which light passes, provided inside of the drive stage.

Growing community of inventors

Kawasaki, Japan

Nobuki Yoshimatsu