Sumitomo Chemical Company, Limited

Nobuhito Fukui

Yuko Yako

Kenji Takahashi

Hiroshi Takagaki

Koshiro Ochiai

Koji Ichikawa

Yuji Ueda

Naoki Takeyama

Takehiro Kusumoto

Shigeki Yamamoto

A photoresist composition which is particularly useful as a chemical amplification type photoresist is provided, wherein the photoresist composition contains a resin having a structural unit represented by the following formula (I):

Photoresist compositions

A photoresist composition comprising a resin having structural units represented by the following formulas (I), (II) and (III): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.11, R.sup.12, R.sup.13, R.sup.21, R.sup.22 and R.sup.23 each independently represents hydrogen or an alkyl; one of R.sup.14, R.sup.15 and R.sup.16 represents an aliphatic hydrocarbon residue and the rest each independently represents hydrogen or an aliphatic hydrocarbon residue, or two or three of R.sup.14, R.sup.15 and R.sup.16 form a hydrocarbon ring; and R represents a group cleavable by an action of an acid; and the photoresist composition affords excellent resolution, excellent profile and wide focus margin even on a substrate provided with an organic anti-reflective film.

Photo resist composition

A chemical amplifying type positive photoresist composition, excellent in various properties such as film retention ratio, applicability, heat resistance, sensitivity, resolution, profile and time delay resistance, and not easily affected by environment, which comprises (A) a resin which is converted to alkali-soluble by the action of an acid, (B) an acid generator and (C) a tertiary amine compound having an ether bond; and a fine photoresist pattern can be formed in high precision using the photoresist composition.

Photoresist composition

A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises

Positive resist composition

A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity, resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises

A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile;

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Toyonaka, Japan

Nobuhito Fukui