Tokyo Ohka Kogyo Co., Ltd.

Nobuhiro Michibayashi

Masatoshi Arai

Yoshitaka Komuro

KhanhTin Nguyen

Hiroto Yamazaki

Mari Murata

Akiyoshi Yamazaki

Daisuke Kawana

Takuya Ikeda

Masahiro Shiosaki

Takatoshi Inari

Seiji Todoroki

A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, Mrepresents an m-valent organic cation, Rrepresents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of 'n+p≤(q×2)+5' is satisfied.

Resist composition, method of forming resist pattern, and compound

An alternating copolymer including a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2) in which Rprepresents a hydrogen atom or the like; Vprepresents a single bond or a divalent linking group; Rpand Rpeach independently represents a hydrocarbon group which may have a substituent, or Rpand Rpare mutually bonded to form a ring; Rprepresents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; Rprepresents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a cyano group or a hydroxy group; Rprepresents a linear or branched aliphatic hydrocarbon group; and m represents an integer of 0 to 4

Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern

A resist composition that generates an acid upon exposure and whose solubility in a developing solution is changed by action of an acid. The resist composition includes a base material component whose solubility in a developing solution is changed by action of an acid, and a compound represented by General Formula (d0) in which Rdrepresents a monovalent organic group, Rdrepresents a single bond or a divalent linking group, m represents an integer of 1 or greater, and Mrepresents an m-valent organic cation

Resist composition, method of forming resist pattern, and acid diffusion-controlling agent

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, Rrepresents an unsaturated hydrocarbon group which may have a substituent, Rand Rrepresent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an &#x3b1;-position of Cconstitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), Wrepresents a polymerizable group-containing group, Warepresents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3

Resist composition and method of forming resist pattern

A resist composition containing a resin component having a structural unit containing a group which is dissociated under the action of an acid and compound represented by the general formula (bd1). In the formula (bd1), Rxto Rxrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Ryto Ryrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, and Rzto Rzrepresent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rxto Rx, Ryto Ryand Rzto Rzhas an anion group, the entire anion moiety may be an n-valent anion, and Mrepresents an m-valent organic cation 

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Kawasaki, Japan

Nobuhiro Michibayashi