Agc Inc.

Nobuhiko Takeshita

Kazutaka Ono

Shuhei Nomura

Yu Hanawa

Keisuke Hanashima

Shigeki Sawamura

Nobutaka Kidera

Hirofumi Yamamoto

Osamu Sato

Toru Momose

A method of producing a glass article includes holding a carrier having a circular shape, in which a glass substrate having a circular shape is retained, with an upper surface plate and a lower surface plate; and polishing the glass substrate by rotating the carrier with respect to the upper surface plate and the lower surface plate, to obtain the glass article. The glass substrate is disposed in the carrier such that, in a top plan view, a center of the carrier is included in a region of the glass substrate, and a center of the glass substrate is shifted from the center of the carrier.

Glass article and method of producing glass article

A glass substrate for a high-frequency device, which contains, in terms of mole percent on the basis of oxides: 40 to 75% of SiO; 0 to 15% of AlO; 13 to 23% of BO; 2.5 to 11% of MgO; and 0 to 13% of CaO, and having a total content of alkali metal oxides in the range of 0.001-5%, where at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.

Glass substrate for high-frequency device and circuit board for high-frequency device

The present invention provides a glass substrate in which in a step of sticking a glass substrate and a silicon-containing substrate to each other, bubbles hardly intrude therebetween. The present invention relates to a glass substrate for forming a laminated substrate by lamination with a silicon-containing substrate, having a warpage of 2 &#x3bc;m to 300 &#x3bc;m, and an inclination angle due to the warpage of 0.0004&#xb0; to 0.12&#xb0;.

Glass substrate and laminated substrate

A glass substrate for a high-frequency device, which contains SiOas a main component, the glass substrate having a total content of alkali metal oxides in the range of 0.001-5% in terms of mole percent on the basis of oxides, the alkali metal oxides having a molar ratio represented by NaO/(NaO+KO) in the range of 0.01-0.99, and the glass substrate having a total content of alkaline earth metal oxides in the range of 0.1-13% in terms of mole percent on the basis of oxides, wherein at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.

A glass substrate is laminated with a substrate containing silicon to thereby form a laminated substrate. The glass substrate has a concave surface and a convex surface and has one or more marks that distinguish between the concave surface and the convex surface.

Glass substrate, laminated substrate, laminated substrate manufacturing method, laminate, package, and glass substrate manufacturing method

The present invention relates to a glass substrate for a high-frequency device, which includes SiOas a main component, the glass substrate having a total content of alkali metal oxides in the range of 0.001-5% in terms of mole percent on the basis of oxides, the alkali metal oxides having a molar ratio represented by NaO/(NaO+KO) in the range of 0.01-0.99, and the glass substrate having a total content of AlOand BOin the range of 1-40% in terms of mole percent on the basis of oxides and having a molar ratio represented by AlO/(AlO+BO) in the range of 0-0.45, in which at least one main surface of the glass substrate has a surface roughness of 1.5 nm or less in terms of arithmetic average roughness Ra, and the glass substrate has a dielectric dissipation factor at 35 GHz of 0.007 or less.

Growing community of inventors

Tokyo, Japan

Nobuhiko Takeshita