Oki Electric Industry Co., Ltd.

Noboru Uchida

Takashi Taguchi

Satoshi Machida

Suguru Sasaki

A semiconductor device comprises a semiconductor substrate having a first surface and a second surface, and a first multilayer laminated structure film which is formed in the first surface of the semiconductor substrate and has a first layer having a first refractive index, a second layer formed on the first layer and having a second refractive index lower than the first refractive index, and a third layer formed on the second layer and having a third refractive index higher than the second refractive index, and in which the thicknesses of the respective layers are respectively thicknesses calculated by (2N+1)&#x3bb;/(4n) where the wavelength of light used for detecting the first multilayer laminated structure film is defined as &#x3bb;, the refractive indices of the respective layers are defined as n, and N is defined as 0 or a natural number.

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Tokyo, Japan

Noboru Uchida